Details
Originalsprache | Englisch |
---|---|
Veröffentlichungsnummer (amtliches Aktenzeichen) | US2014302442 |
IPC | G03F 7/ 20 A I |
Prioritätsdatum | 4 Apr. 2013 |
Publikationsstatus | Veröffentlicht - 9 Okt. 2014 |
Abstract
An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
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Patent Nr.: US2014302442. Okt. 09, 2014.
Publikation: Schutzrecht/Patent › Patent
}
TY - PAT
T1 - METHODS AND FABRICATION TOOLS FOR FABRICATING OPTICAL DEVICES
AU - Schell, Andreas
AU - Fischer, Joachim
AU - Kaschke, Johannes
AU - Benson, Oliver
AU - Wegener, Martin
PY - 2014/10/9
Y1 - 2014/10/9
N2 - An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
AB - An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
M3 - Patent
M1 - US2014302442
ER -