Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 823-826 |
| Seitenumfang | 4 |
| Fachzeitschrift | Zhongguo Jiguang/Chinese Journal of Lasers |
| Jahrgang | 33 |
| Ausgabenummer | 6 |
| Publikationsstatus | Veröffentlicht - Juni 2006 |
| Extern publiziert | Ja |
Abstract
A laser calorimeter in compliance with ISO 11551 was developed to measure the absolute absorptance of optical thin films. Under a typical condition the absorptance sensitivity of the calorimeter was better than 10-6 and the measurement error was estimated to be -10%. For an uncoated fused silica substrate with 1-mm thickness, the measured absorptance was 3.4 × 10-6 and the sensitivity was -1.5 × 10-7. The laser calorimeter was employed to measure the absorptance of highly reflective dielectric coatings prepared by two different coating techniques. The absolute absorptance of a 0° Ta2O5/SiO2 multilayer mirror prepared by the ion beam sputtering (IBS) technique was as low as 1.08 × 10-5, and the absorptance of a 45° HfO2/SiO2 multilayer mirror prepared by the ion-assisted deposition (IAD) technique was 6.83 × 10-5, respectively.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Zhongguo Jiguang/Chinese Journal of Lasers, Jahrgang 33, Nr. 6, 06.2006, S. 823-826.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Measuring weak absorptance of optical thin films with laser calorimetric technique
AU - Li, Bin Cheng
AU - Xiong, Sheng Ming
AU - Blaschke, Holger
AU - Ristau, Detlev
PY - 2006/6
Y1 - 2006/6
N2 - A laser calorimeter in compliance with ISO 11551 was developed to measure the absolute absorptance of optical thin films. Under a typical condition the absorptance sensitivity of the calorimeter was better than 10-6 and the measurement error was estimated to be -10%. For an uncoated fused silica substrate with 1-mm thickness, the measured absorptance was 3.4 × 10-6 and the sensitivity was -1.5 × 10-7. The laser calorimeter was employed to measure the absorptance of highly reflective dielectric coatings prepared by two different coating techniques. The absolute absorptance of a 0° Ta2O5/SiO2 multilayer mirror prepared by the ion beam sputtering (IBS) technique was as low as 1.08 × 10-5, and the absorptance of a 45° HfO2/SiO2 multilayer mirror prepared by the ion-assisted deposition (IAD) technique was 6.83 × 10-5, respectively.
AB - A laser calorimeter in compliance with ISO 11551 was developed to measure the absolute absorptance of optical thin films. Under a typical condition the absorptance sensitivity of the calorimeter was better than 10-6 and the measurement error was estimated to be -10%. For an uncoated fused silica substrate with 1-mm thickness, the measured absorptance was 3.4 × 10-6 and the sensitivity was -1.5 × 10-7. The laser calorimeter was employed to measure the absorptance of highly reflective dielectric coatings prepared by two different coating techniques. The absolute absorptance of a 0° Ta2O5/SiO2 multilayer mirror prepared by the ion beam sputtering (IBS) technique was as low as 1.08 × 10-5, and the absorptance of a 45° HfO2/SiO2 multilayer mirror prepared by the ion-assisted deposition (IAD) technique was 6.83 × 10-5, respectively.
KW - Laser calorimetry
KW - Measurement technique
KW - Optical thin films
KW - Weak absorptance
UR - http://www.scopus.com/inward/record.url?scp=33746832032&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:33746832032
VL - 33
SP - 823
EP - 826
JO - Zhongguo Jiguang/Chinese Journal of Lasers
JF - Zhongguo Jiguang/Chinese Journal of Lasers
SN - 0258-7025
IS - 6
ER -