Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Untertitel | 2010 |
| Publikationsstatus | Veröffentlicht - 2 Dez. 2010 |
| Veranstaltung | 42nd Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2010 - Boulder, CO, USA / Vereinigte Staaten Dauer: 26 Sept. 2010 → 29 Sept. 2010 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 7842 |
| ISSN (Print) | 0277-786X |
Abstract
The measurement of absorption in dielectric materials is one of the most important methods for the qualification of the losses of optical components. For this reason, various procedures were developed for the measurement of the absorption losses. One of the most sophisticated and established technique is the laser calorimetric measurement according to ISO11551. The method allows to measure the absolute value of absorption losses. In the presented measurement campaign, two sets of samples are investigated by laser calorimetric measurements. The study displays the results of the linear and non-linear absorption measurements of TixSi1-xO2 -single layers coated by ion beam sputtering. For the determination of the linear absorption behaviour a quasi CW-Laser at the wavelengths 532nm and 1064nm was applied Additionally, the non linear absorption is measured by a Ti:Sapphire CPA-Laser at 790nm.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 78421S (Proceedings of SPIE - The International Society for Optical Engineering; Band 7842).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Linear and non-linear absorption of TixSi1-xO 2-mixtures
AU - Jupé, Marco
AU - Jensen, Lars
AU - Malobabic, Sina
AU - Ristau, Detlev
AU - Starke, Kai
PY - 2010/12/2
Y1 - 2010/12/2
N2 - The measurement of absorption in dielectric materials is one of the most important methods for the qualification of the losses of optical components. For this reason, various procedures were developed for the measurement of the absorption losses. One of the most sophisticated and established technique is the laser calorimetric measurement according to ISO11551. The method allows to measure the absolute value of absorption losses. In the presented measurement campaign, two sets of samples are investigated by laser calorimetric measurements. The study displays the results of the linear and non-linear absorption measurements of TixSi1-xO2 -single layers coated by ion beam sputtering. For the determination of the linear absorption behaviour a quasi CW-Laser at the wavelengths 532nm and 1064nm was applied Additionally, the non linear absorption is measured by a Ti:Sapphire CPA-Laser at 790nm.
AB - The measurement of absorption in dielectric materials is one of the most important methods for the qualification of the losses of optical components. For this reason, various procedures were developed for the measurement of the absorption losses. One of the most sophisticated and established technique is the laser calorimetric measurement according to ISO11551. The method allows to measure the absolute value of absorption losses. In the presented measurement campaign, two sets of samples are investigated by laser calorimetric measurements. The study displays the results of the linear and non-linear absorption measurements of TixSi1-xO2 -single layers coated by ion beam sputtering. For the determination of the linear absorption behaviour a quasi CW-Laser at the wavelengths 532nm and 1064nm was applied Additionally, the non linear absorption is measured by a Ti:Sapphire CPA-Laser at 790nm.
KW - ISO11551
KW - linear absorption
KW - mixture materials
KW - non linear absorption
UR - http://www.scopus.com/inward/record.url?scp=79751490634&partnerID=8YFLogxK
U2 - 10.1117/12.867767
DO - 10.1117/12.867767
M3 - Conference contribution
AN - SCOPUS:79751490634
SN - 9780819483652
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
T2 - 42nd Annual Laser Damage Symposium
Y2 - 26 September 2010 through 29 September 2010
ER -