Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 1964-1966 |
Seitenumfang | 3 |
Fachzeitschrift | Physica Status Solidi (A) Applications and Materials Science |
Jahrgang | 208 |
Ausgabenummer | 8 |
Frühes Online-Datum | 29 März 2011 |
Publikationsstatus | Veröffentlicht - 10 Aug. 2011 |
Abstract
We demonstrate laser transfer doping (LTD) for producing locally doped regions in surface passivated Silicon wafers. A pulsed laser transfers phosphorus-doped amorphous silicon from a carrier glass to a surface passivated silicon wafer. We employ this process for producing local high-low junctions for the formation of n +-n back surface field layers that are contacted with Al. The contact's surface recombination velocities and the contact resistances depend on the laser processing and annealing conditions. They range from S cont = 20 to 1500 cm s -1 and from R cont = 1 to 1000 mω cm 2, respectively. The combination of acceptable contact resistance and low recombination velocities makes the LTD technique suitable for the formation of the rear contacts of n-type high-efficiency solar cells. The simplicity of the process makes it a candidate for industrial production.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
- Werkstoffwissenschaften (insg.)
- Werkstoffchemie
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in: Physica Status Solidi (A) Applications and Materials Science, Jahrgang 208, Nr. 8, 10.08.2011, S. 1964-1966.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Laser transfer doping for contacting n-type crystalline Si solar cells
AU - Ferré, Rafel
AU - Gogolin, Ralf
AU - Müller, Jens
AU - Harder, Nils Peter
AU - Brendel, Rolf
PY - 2011/8/10
Y1 - 2011/8/10
N2 - We demonstrate laser transfer doping (LTD) for producing locally doped regions in surface passivated Silicon wafers. A pulsed laser transfers phosphorus-doped amorphous silicon from a carrier glass to a surface passivated silicon wafer. We employ this process for producing local high-low junctions for the formation of n +-n back surface field layers that are contacted with Al. The contact's surface recombination velocities and the contact resistances depend on the laser processing and annealing conditions. They range from S cont = 20 to 1500 cm s -1 and from R cont = 1 to 1000 mω cm 2, respectively. The combination of acceptable contact resistance and low recombination velocities makes the LTD technique suitable for the formation of the rear contacts of n-type high-efficiency solar cells. The simplicity of the process makes it a candidate for industrial production.
AB - We demonstrate laser transfer doping (LTD) for producing locally doped regions in surface passivated Silicon wafers. A pulsed laser transfers phosphorus-doped amorphous silicon from a carrier glass to a surface passivated silicon wafer. We employ this process for producing local high-low junctions for the formation of n +-n back surface field layers that are contacted with Al. The contact's surface recombination velocities and the contact resistances depend on the laser processing and annealing conditions. They range from S cont = 20 to 1500 cm s -1 and from R cont = 1 to 1000 mω cm 2, respectively. The combination of acceptable contact resistance and low recombination velocities makes the LTD technique suitable for the formation of the rear contacts of n-type high-efficiency solar cells. The simplicity of the process makes it a candidate for industrial production.
KW - amorphous silicon
KW - contacts
KW - laser doping
KW - transfer
UR - http://www.scopus.com/inward/record.url?scp=80051678194&partnerID=8YFLogxK
U2 - 10.1002/pssa.201127046
DO - 10.1002/pssa.201127046
M3 - Article
AN - SCOPUS:80051678194
VL - 208
SP - 1964
EP - 1966
JO - Physica Status Solidi (A) Applications and Materials Science
JF - Physica Status Solidi (A) Applications and Materials Science
SN - 1862-6300
IS - 8
ER -