Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Thin Films IV |
| Publikationsstatus | Veröffentlicht - 3 Okt. 2011 |
| Veranstaltung | Advances in Optical Thin Films IV - Marseille, Frankreich Dauer: 5 Sept. 2011 → 7 Sept. 2011 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8168 |
| ISSN (Print) | 0277-786X |
Abstract
High reflecting multilayer coatings play a key role for many applications of pulsed Nd:YAG high power lasers in industry and science. In the present contribution, improvements in the optical properties and the radiation resistance of high reflectors for 355nm and 1064nm wavelength on the basis of mixture materials are discussed. Within a co-operation between the LASEROPTIK GmbH and the Laser Zentrum Hannover e.V., several deposition processes including Ion Beam Sputtering, Magnetron Sputtering, and Electron Beam Evaporation could be addressed for this study. The selected material combinations HfO 2+ZrO2/SiO2, HfO2+Al 2O3/SiO2, HfO2+SiO 2/SiO2 and HfO2/SiO2 were deposited using a zone target assembly for the IBS technique or defined material mixtures for the evaporation process. Single layers of the applied mixtures were analyzed by UV/Vis/NIR spectroscopy to correlate the optical constants with the atomic compositions quantified by Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS). In addition to pure material reference mirrors and reflecting multilayer coatings with high index material mixtures, also interference coatings consisting of nanolaminates as well as multilayer systems with refractive index profiles were produced. The laser induced damage thresholds at 1064nm wavelength for nanosecond pulse durations were measured in a 1000on1 experiment complying with the standard ISO11254. For the 355nm high reflectors, the radiation resistance was determined in a 10000on1 procedure, furthermore, the radiation-induced absorption was measured by laser calorimetry according to ISO11551. Finally, the layer interfaces and the amorphous microstructure of selected multilayers were analyzed by Transmission Electron Microscopy (TEM) to obtain detailed information about possible partial crystallinity. The results are interpreted in the context of former investigations on the power handling capability of coating systems involving material mixtures.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Advances in Optical Thin Films IV. 2011. 1 (Proceedings of SPIE - The International Society for Optical Engineering; Band 8168).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Laser induced damage of pure and mixture material high reflectors for 355nm and 1064nm wavelength
AU - Mende, Mathias
AU - Jensen, Lars O.
AU - Ehlers, Henrik
AU - Riggers, Werner
AU - Blaschke, Holger
AU - Ristau, Detlev
PY - 2011/10/3
Y1 - 2011/10/3
N2 - High reflecting multilayer coatings play a key role for many applications of pulsed Nd:YAG high power lasers in industry and science. In the present contribution, improvements in the optical properties and the radiation resistance of high reflectors for 355nm and 1064nm wavelength on the basis of mixture materials are discussed. Within a co-operation between the LASEROPTIK GmbH and the Laser Zentrum Hannover e.V., several deposition processes including Ion Beam Sputtering, Magnetron Sputtering, and Electron Beam Evaporation could be addressed for this study. The selected material combinations HfO 2+ZrO2/SiO2, HfO2+Al 2O3/SiO2, HfO2+SiO 2/SiO2 and HfO2/SiO2 were deposited using a zone target assembly for the IBS technique or defined material mixtures for the evaporation process. Single layers of the applied mixtures were analyzed by UV/Vis/NIR spectroscopy to correlate the optical constants with the atomic compositions quantified by Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS). In addition to pure material reference mirrors and reflecting multilayer coatings with high index material mixtures, also interference coatings consisting of nanolaminates as well as multilayer systems with refractive index profiles were produced. The laser induced damage thresholds at 1064nm wavelength for nanosecond pulse durations were measured in a 1000on1 experiment complying with the standard ISO11254. For the 355nm high reflectors, the radiation resistance was determined in a 10000on1 procedure, furthermore, the radiation-induced absorption was measured by laser calorimetry according to ISO11551. Finally, the layer interfaces and the amorphous microstructure of selected multilayers were analyzed by Transmission Electron Microscopy (TEM) to obtain detailed information about possible partial crystallinity. The results are interpreted in the context of former investigations on the power handling capability of coating systems involving material mixtures.
AB - High reflecting multilayer coatings play a key role for many applications of pulsed Nd:YAG high power lasers in industry and science. In the present contribution, improvements in the optical properties and the radiation resistance of high reflectors for 355nm and 1064nm wavelength on the basis of mixture materials are discussed. Within a co-operation between the LASEROPTIK GmbH and the Laser Zentrum Hannover e.V., several deposition processes including Ion Beam Sputtering, Magnetron Sputtering, and Electron Beam Evaporation could be addressed for this study. The selected material combinations HfO 2+ZrO2/SiO2, HfO2+Al 2O3/SiO2, HfO2+SiO 2/SiO2 and HfO2/SiO2 were deposited using a zone target assembly for the IBS technique or defined material mixtures for the evaporation process. Single layers of the applied mixtures were analyzed by UV/Vis/NIR spectroscopy to correlate the optical constants with the atomic compositions quantified by Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS). In addition to pure material reference mirrors and reflecting multilayer coatings with high index material mixtures, also interference coatings consisting of nanolaminates as well as multilayer systems with refractive index profiles were produced. The laser induced damage thresholds at 1064nm wavelength for nanosecond pulse durations were measured in a 1000on1 experiment complying with the standard ISO11254. For the 355nm high reflectors, the radiation resistance was determined in a 10000on1 procedure, furthermore, the radiation-induced absorption was measured by laser calorimetry according to ISO11551. Finally, the layer interfaces and the amorphous microstructure of selected multilayers were analyzed by Transmission Electron Microscopy (TEM) to obtain detailed information about possible partial crystallinity. The results are interpreted in the context of former investigations on the power handling capability of coating systems involving material mixtures.
KW - 1064nm
KW - 355nm
KW - Hafnia mixtures
KW - High reflecting multilayers
KW - Laser induced damage
UR - http://www.scopus.com/inward/record.url?scp=80455174267&partnerID=8YFLogxK
U2 - 10.1117/12.897049
DO - 10.1117/12.897049
M3 - Conference contribution
AN - SCOPUS:80455174267
SN - 9780819487940
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films IV
T2 - Advances in Optical Thin Films IV
Y2 - 5 September 2011 through 7 September 2011
ER -