Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 681-688 |
Seitenumfang | 8 |
Fachzeitschrift | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
Jahrgang | 19 |
Ausgabenummer | 2 |
Publikationsstatus | Veröffentlicht - 12 März 2001 |
Extern publiziert | Ja |
Abstract
A 248 nm KrF excimer laser was used to study the damage on MgF2 thin films deposited on fused silica and CaF2 substrates. The photoacoustic beam deflection technique was used to obtain information on the radiation-film interaction processes, which can be used to validate the damage processes revealed by scanning electron microscopy (SEM). A large intrinsic tensile stress resulted from the mismatch between the thermal expansion coefficient of a fused silica substrate and the MgF2 film.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
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in: Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Jahrgang 19, Nr. 2, 12.03.2001, S. 681-688.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Laser damage studies on MgF2 thin films
AU - Protopapa, Maria Lucia
AU - De Tomasi, Ferdinando
AU - Perrone, Maria Rita
AU - Piegari, Angela
AU - Masetti, Enrico
AU - Ristau, Detlev
AU - Quesnel, Etienne
AU - Duparré, Angela
PY - 2001/3/12
Y1 - 2001/3/12
N2 - A 248 nm KrF excimer laser was used to study the damage on MgF2 thin films deposited on fused silica and CaF2 substrates. The photoacoustic beam deflection technique was used to obtain information on the radiation-film interaction processes, which can be used to validate the damage processes revealed by scanning electron microscopy (SEM). A large intrinsic tensile stress resulted from the mismatch between the thermal expansion coefficient of a fused silica substrate and the MgF2 film.
AB - A 248 nm KrF excimer laser was used to study the damage on MgF2 thin films deposited on fused silica and CaF2 substrates. The photoacoustic beam deflection technique was used to obtain information on the radiation-film interaction processes, which can be used to validate the damage processes revealed by scanning electron microscopy (SEM). A large intrinsic tensile stress resulted from the mismatch between the thermal expansion coefficient of a fused silica substrate and the MgF2 film.
UR - http://www.scopus.com/inward/record.url?scp=0035273638&partnerID=8YFLogxK
U2 - 10.1116/1.1347049
DO - 10.1116/1.1347049
M3 - Article
AN - SCOPUS:0035273638
VL - 19
SP - 681
EP - 688
JO - Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 2
ER -