Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Eric Eva
  • Klaus Mann
  • Norbert Kaiser
  • B. Anton
  • Rainer Henking
  • Detlev Ristau
  • P. Weissbrodt
  • D. Mademann
  • L. Raupach
  • Erich Hacker

Externe Organisationen

  • Laser-Laboratorium Göttingen e.V. (LLG)
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • Laser Zentrum Hannover e.V. (LZH)
  • JENOPTIK Laser GmbH
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)5613-5619
Seitenumfang7
FachzeitschriftApplied Optics
Jahrgang35
Ausgabenummer28
PublikationsstatusVeröffentlicht - 1 Okt. 1996
Extern publiziertJa

Abstract

Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

ASJC Scopus Sachgebiete

Zitieren

Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm. / Eva, Eric; Mann, Klaus; Kaiser, Norbert et al.
in: Applied Optics, Jahrgang 35, Nr. 28, 01.10.1996, S. 5613-5619.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Eva, E, Mann, K, Kaiser, N, Anton, B, Henking, R, Ristau, D, Weissbrodt, P, Mademann, D, Raupach, L & Hacker, E 1996, 'Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm', Applied Optics, Jg. 35, Nr. 28, S. 5613-5619. https://doi.org/10.1364/AO.35.005613
Eva, E., Mann, K., Kaiser, N., Anton, B., Henking, R., Ristau, D., Weissbrodt, P., Mademann, D., Raupach, L., & Hacker, E. (1996). Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm. Applied Optics, 35(28), 5613-5619. https://doi.org/10.1364/AO.35.005613
Eva E, Mann K, Kaiser N, Anton B, Henking R, Ristau D et al. Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm. Applied Optics. 1996 Okt 1;35(28):5613-5619. doi: 10.1364/AO.35.005613
Eva, Eric ; Mann, Klaus ; Kaiser, Norbert et al. / Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm. in: Applied Optics. 1996 ; Jahrgang 35, Nr. 28. S. 5613-5619.
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T1 - Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm

AU - Eva, Eric

AU - Mann, Klaus

AU - Kaiser, Norbert

AU - Anton, B.

AU - Henking, Rainer

AU - Ristau, Detlev

AU - Weissbrodt, P.

AU - Mademann, D.

AU - Raupach, L.

AU - Hacker, Erich

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AB - Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

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KW - Fluoride coatings

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