Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Mathias Homann
  • Bernhard von Boehn
  • Arjun Malhotra
  • Luca Gregoratti
  • Matteo Amati
  • Patrick Zeller
  • Ronald Imbihl

Externe Organisationen

  • Sincrotrone Trieste
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Details

OriginalspracheEnglisch
Seiten (von - bis)56-63
Seitenumfang8
FachzeitschriftSurface science
Jahrgang679
Frühes Online-Datum31 Aug. 2018
PublikationsstatusVeröffentlicht - Jan. 2019

Abstract

The behavior of ultrathin layers of nickel (0.5 ≤ θNi ≤ 1.4 monolayers (ML)) on Rh(110) has been studied in oxidation/reduction experiments with O2 and H2 at T = 770 K. The reaction has been followed with Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and scanning photoelectron microscopy (SPEM). The adsorption of oxygen leads to a large decrease (up to 90%) of the Ni signal in AES. Subsequent titration with hydrogen restores nearly the initial Ni signal. The peculiar behavior of Ni on Rh(110) upon O2 adsorption is attributed to a large nucleation barrier for Ni oxide formation on Rh(110). This barrier leads to the preferential formation of chemisorbed oxygen on Rh sites forcing Ni into subsurface sites. SPEM reveals that also small NiO particles with a diameter of ≈1 µm develop during O2 adsorption. For comparison, a Rh(110) surface with a thick Ni layer of an estimated thickness of about 8–9 ML has been prepared. On this thick Ni layer Ni oxide develops spontaneously during O2 adsorption in the in 10−6 mbar range at T = 770 K.

ASJC Scopus Sachgebiete

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Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation. / Homann, Mathias; von Boehn, Bernhard; Malhotra, Arjun et al.
in: Surface science, Jahrgang 679, 01.2019, S. 56-63.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Homann, M, von Boehn, B, Malhotra, A, Gregoratti, L, Amati, M, Zeller, P & Imbihl, R 2019, 'Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation', Surface science, Jg. 679, S. 56-63. https://doi.org/10.1016/j.susc.2018.08.029
Homann, M., von Boehn, B., Malhotra, A., Gregoratti, L., Amati, M., Zeller, P., & Imbihl, R. (2019). Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation. Surface science, 679, 56-63. https://doi.org/10.1016/j.susc.2018.08.029
Homann M, von Boehn B, Malhotra A, Gregoratti L, Amati M, Zeller P et al. Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation. Surface science. 2019 Jan;679:56-63. Epub 2018 Aug 31. doi: 10.1016/j.susc.2018.08.029
Homann, Mathias ; von Boehn, Bernhard ; Malhotra, Arjun et al. / Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation. in: Surface science. 2019 ; Jahrgang 679. S. 56-63.
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abstract = "The behavior of ultrathin layers of nickel (0.5 ≤ θNi ≤ 1.4 monolayers (ML)) on Rh(110) has been studied in oxidation/reduction experiments with O2 and H2 at T = 770 K. The reaction has been followed with Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and scanning photoelectron microscopy (SPEM). The adsorption of oxygen leads to a large decrease (up to 90%) of the Ni signal in AES. Subsequent titration with hydrogen restores nearly the initial Ni signal. The peculiar behavior of Ni on Rh(110) upon O2 adsorption is attributed to a large nucleation barrier for Ni oxide formation on Rh(110). This barrier leads to the preferential formation of chemisorbed oxygen on Rh sites forcing Ni into subsurface sites. SPEM reveals that also small NiO particles with a diameter of ≈1 µm develop during O2 adsorption. For comparison, a Rh(110) surface with a thick Ni layer of an estimated thickness of about 8–9 ML has been prepared. On this thick Ni layer Ni oxide develops spontaneously during O2 adsorption in the in 10−6 mbar range at T = 770 K.",
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T1 - Large nucleation barrier for Ni oxide on Rh(110) driving Ni into subsurface sites upon oxidation

AU - Homann, Mathias

AU - von Boehn, Bernhard

AU - Malhotra, Arjun

AU - Gregoratti, Luca

AU - Amati, Matteo

AU - Zeller, Patrick

AU - Imbihl, Ronald

N1 - Funding Information: The authors are indebted to the DFG (Deutsche Forschungsgemeinschaft) for financial support.

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Y1 - 2019/1

N2 - The behavior of ultrathin layers of nickel (0.5 ≤ θNi ≤ 1.4 monolayers (ML)) on Rh(110) has been studied in oxidation/reduction experiments with O2 and H2 at T = 770 K. The reaction has been followed with Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and scanning photoelectron microscopy (SPEM). The adsorption of oxygen leads to a large decrease (up to 90%) of the Ni signal in AES. Subsequent titration with hydrogen restores nearly the initial Ni signal. The peculiar behavior of Ni on Rh(110) upon O2 adsorption is attributed to a large nucleation barrier for Ni oxide formation on Rh(110). This barrier leads to the preferential formation of chemisorbed oxygen on Rh sites forcing Ni into subsurface sites. SPEM reveals that also small NiO particles with a diameter of ≈1 µm develop during O2 adsorption. For comparison, a Rh(110) surface with a thick Ni layer of an estimated thickness of about 8–9 ML has been prepared. On this thick Ni layer Ni oxide develops spontaneously during O2 adsorption in the in 10−6 mbar range at T = 770 K.

AB - The behavior of ultrathin layers of nickel (0.5 ≤ θNi ≤ 1.4 monolayers (ML)) on Rh(110) has been studied in oxidation/reduction experiments with O2 and H2 at T = 770 K. The reaction has been followed with Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and scanning photoelectron microscopy (SPEM). The adsorption of oxygen leads to a large decrease (up to 90%) of the Ni signal in AES. Subsequent titration with hydrogen restores nearly the initial Ni signal. The peculiar behavior of Ni on Rh(110) upon O2 adsorption is attributed to a large nucleation barrier for Ni oxide formation on Rh(110). This barrier leads to the preferential formation of chemisorbed oxygen on Rh sites forcing Ni into subsurface sites. SPEM reveals that also small NiO particles with a diameter of ≈1 µm develop during O2 adsorption. For comparison, a Rh(110) surface with a thick Ni layer of an estimated thickness of about 8–9 ML has been prepared. On this thick Ni layer Ni oxide develops spontaneously during O2 adsorption in the in 10−6 mbar range at T = 770 K.

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