Ion-assisted deposition of oxide materials at room temperature by use of different ion sources

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Hansjörg Niederwald
  • M. Mertin
  • Sven Laux
  • Angela Duparré
  • Norbert Kaiser
  • Detlev Ristau

Externe Organisationen

  • Carl Zeiss SMT GmbH
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • Laser Zentrum Hannover e.V. (LZH)
  • Mso Jena Mikroschichtoptik GmbH
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)3610-3613
Seitenumfang4
FachzeitschriftApplied Optics
Jahrgang38
Ausgabenummer16
PublikationsstatusVeröffentlicht - 1 Juni 1999
Extern publiziertJa

Abstract

Thin films of SiO2, TiO2, Ta2O5, ZrO2, and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance.

ASJC Scopus Sachgebiete

Zitieren

Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. / Niederwald, Hansjörg; Mertin, M.; Laux, Sven et al.
in: Applied Optics, Jahrgang 38, Nr. 16, 01.06.1999, S. 3610-3613.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Niederwald, H, Mertin, M, Laux, S, Duparré, A, Kaiser, N & Ristau, D 1999, 'Ion-assisted deposition of oxide materials at room temperature by use of different ion sources', Applied Optics, Jg. 38, Nr. 16, S. 3610-3613. https://doi.org/10.1364/AO.38.003610
Niederwald, H., Mertin, M., Laux, S., Duparré, A., Kaiser, N., & Ristau, D. (1999). Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. Applied Optics, 38(16), 3610-3613. https://doi.org/10.1364/AO.38.003610
Niederwald H, Mertin M, Laux S, Duparré A, Kaiser N, Ristau D. Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. Applied Optics. 1999 Jun 1;38(16):3610-3613. doi: 10.1364/AO.38.003610
Niederwald, Hansjörg ; Mertin, M. ; Laux, Sven et al. / Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. in: Applied Optics. 1999 ; Jahrgang 38, Nr. 16. S. 3610-3613.
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@article{ba47bf244ba4404b8eaf75afc8b8c27e,
title = "Ion-assisted deposition of oxide materials at room temperature by use of different ion sources",
abstract = "Thin films of SiO2, TiO2, Ta2O5, ZrO2, and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance.",
author = "Hansj{\"o}rg Niederwald and M. Mertin and Sven Laux and Angela Duparr{\'e} and Norbert Kaiser and Detlev Ristau",
year = "1999",
month = jun,
day = "1",
doi = "10.1364/AO.38.003610",
language = "English",
volume = "38",
pages = "3610--3613",
journal = "Applied Optics",
issn = "1559-128X",
publisher = "OSA - The Optical Society",
number = "16",

}

Download

TY - JOUR

T1 - Ion-assisted deposition of oxide materials at room temperature by use of different ion sources

AU - Niederwald, Hansjörg

AU - Mertin, M.

AU - Laux, Sven

AU - Duparré, Angela

AU - Kaiser, Norbert

AU - Ristau, Detlev

PY - 1999/6/1

Y1 - 1999/6/1

N2 - Thin films of SiO2, TiO2, Ta2O5, ZrO2, and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance.

AB - Thin films of SiO2, TiO2, Ta2O5, ZrO2, and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance.

UR - http://www.scopus.com/inward/record.url?scp=0000272248&partnerID=8YFLogxK

U2 - 10.1364/AO.38.003610

DO - 10.1364/AO.38.003610

M3 - Article

AN - SCOPUS:0000272248

VL - 38

SP - 3610

EP - 3613

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

IS - 16

ER -