Ion source characterization based on an array of retarding field analyzers

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • Nils Beermann
  • Henrik Ehlers
  • Detlev Ristau

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksAdvances in optical thin films II
Untertitel13 - 15 September 2005, Jena, Germany
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
ISBN (Print)0-8194-5981-X
PublikationsstatusVeröffentlicht - 4 Okt. 2005
Extern publiziertJa
VeranstaltungAdvances in Optical Thin Films II - Jena, Deutschland
Dauer: 13 Sept. 200515 Sept. 2005

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band5963
ISSN (Print)0277-786X

Abstract

During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.

ASJC Scopus Sachgebiete

Zitieren

Ion source characterization based on an array of retarding field analyzers. / Beermann, Nils; Ehlers, Henrik; Ristau, Detlev.
Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany. Bellingham: SPIE, 2005. (Proceedings of SPIE - The International Society for Optical Engineering; Band 5963).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Beermann, N, Ehlers, H & Ristau, D 2005, Ion source characterization based on an array of retarding field analyzers. in Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany. Proceedings of SPIE - The International Society for Optical Engineering, Bd. 5963, SPIE, Bellingham, Advances in Optical Thin Films II, Jena, Deutschland, 13 Sept. 2005. https://doi.org/10.1117/12.625215
Beermann, N., Ehlers, H., & Ristau, D. (2005). Ion source characterization based on an array of retarding field analyzers. In Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany (Proceedings of SPIE - The International Society for Optical Engineering; Band 5963). SPIE. https://doi.org/10.1117/12.625215
Beermann N, Ehlers H, Ristau D. Ion source characterization based on an array of retarding field analyzers. in Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany. Bellingham: SPIE. 2005. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.625215
Beermann, Nils ; Ehlers, Henrik ; Ristau, Detlev. / Ion source characterization based on an array of retarding field analyzers. Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany. Bellingham : SPIE, 2005. (Proceedings of SPIE - The International Society for Optical Engineering).
Download
@inproceedings{74d6c1b69b5d4453a7661f2b6ffcc2d1,
title = "Ion source characterization based on an array of retarding field analyzers",
abstract = "During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.",
keywords = "Faraday cup, Ion assisted deposition, Ion emission profile, Multicup array, Retarding field analyzer",
author = "Nils Beermann and Henrik Ehlers and Detlev Ristau",
year = "2005",
month = oct,
day = "4",
doi = "10.1117/12.625215",
language = "English",
isbn = "0-8194-5981-X",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
booktitle = "Advances in optical thin films II",
address = "United States",
note = "Advances in Optical Thin Films II ; Conference date: 13-09-2005 Through 15-09-2005",

}

Download

TY - GEN

T1 - Ion source characterization based on an array of retarding field analyzers

AU - Beermann, Nils

AU - Ehlers, Henrik

AU - Ristau, Detlev

PY - 2005/10/4

Y1 - 2005/10/4

N2 - During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.

AB - During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.

KW - Faraday cup

KW - Ion assisted deposition

KW - Ion emission profile

KW - Multicup array

KW - Retarding field analyzer

UR - http://www.scopus.com/inward/record.url?scp=33144468374&partnerID=8YFLogxK

U2 - 10.1117/12.625215

DO - 10.1117/12.625215

M3 - Conference contribution

AN - SCOPUS:33144468374

SN - 0-8194-5981-X

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Advances in optical thin films II

PB - SPIE

CY - Bellingham

T2 - Advances in Optical Thin Films II

Y2 - 13 September 2005 through 15 September 2005

ER -