Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Untertitel | 2010 |
| Publikationsstatus | Veröffentlicht - 30 Nov. 2010 |
| Extern publiziert | Ja |
| Veranstaltung | 42nd Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2010 - Boulder, CO, USA / Vereinigte Staaten Dauer: 26 Sept. 2010 → 29 Sept. 2010 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 7842 |
| ISSN (Print) | 0277-786X |
Abstract
After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 784207 (Proceedings of SPIE - The International Society for Optical Engineering; Band 7842).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses
AU - Jensen, Lars O.
AU - Mende, Mathias
AU - Blaschke, Holger
AU - Ristau, Detlev
AU - Nguyen, Duy
AU - Emmert, Luke
AU - Rudolph, Wolfgang
PY - 2010/11/30
Y1 - 2010/11/30
N2 - After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
AB - After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
KW - LIDT
KW - Oxide Mixtures
KW - SiO/HfO
UR - http://www.scopus.com/inward/record.url?scp=79751516687&partnerID=8YFLogxK
U2 - 10.1117/12.867238
DO - 10.1117/12.867238
M3 - Conference contribution
AN - SCOPUS:79751516687
SN - 9780819483652
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
T2 - 42nd Annual Laser Damage Symposium
Y2 - 26 September 2010 through 29 September 2010
ER -