Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 8212-8219 |
| Seitenumfang | 8 |
| Fachzeitschrift | Applied Optics |
| Jahrgang | 52 |
| Ausgabenummer | 34 |
| Publikationsstatus | Veröffentlicht - 1 Dez. 2013 |
Abstract
Ion beam sputtering (IBS) is an established deposition process used in the production of optical coatings. In this study, a modification of the IBS process, based on additional electromagnetic fields, is examined in an effort to improve the technology. The reported experiments reveal the underlying effects of electromagnetic fields on the distribution of the coating material sputtered from the target. An increase in local deposition rate is observed and discussed in the context of the interaction between the introduced fields and the species in the target area. First approaches toward an optimization of the observed bunching effect on the deposition material are illustrated.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Ingenieurwesen (insg.)
- Ingenieurwesen (sonstige)
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Applied Optics, Jahrgang 52, Nr. 34, 01.12.2013, S. 8212-8219.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Investigations in the guiding efficiency in a modified ion beam sputtering process
AU - Malobabic, Sina
AU - Jupé, Marco
AU - Ristau, Detlev
PY - 2013/12/1
Y1 - 2013/12/1
N2 - Ion beam sputtering (IBS) is an established deposition process used in the production of optical coatings. In this study, a modification of the IBS process, based on additional electromagnetic fields, is examined in an effort to improve the technology. The reported experiments reveal the underlying effects of electromagnetic fields on the distribution of the coating material sputtered from the target. An increase in local deposition rate is observed and discussed in the context of the interaction between the introduced fields and the species in the target area. First approaches toward an optimization of the observed bunching effect on the deposition material are illustrated.
AB - Ion beam sputtering (IBS) is an established deposition process used in the production of optical coatings. In this study, a modification of the IBS process, based on additional electromagnetic fields, is examined in an effort to improve the technology. The reported experiments reveal the underlying effects of electromagnetic fields on the distribution of the coating material sputtered from the target. An increase in local deposition rate is observed and discussed in the context of the interaction between the introduced fields and the species in the target area. First approaches toward an optimization of the observed bunching effect on the deposition material are illustrated.
UR - http://www.scopus.com/inward/record.url?scp=84889609797&partnerID=8YFLogxK
U2 - 10.1364/AO.52.008212
DO - 10.1364/AO.52.008212
M3 - Article
AN - SCOPUS:84889609797
VL - 52
SP - 8212
EP - 8219
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 34
ER -