Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Alexander V. Tikhonravov
  • Michael K. Trubetskov
  • Anna V. Krasilnikova
  • Enrico Masetti
  • Angela Duparré
  • E. Quesnel
  • Detlev Ristau

Externe Organisationen

  • Lomonosov Moscow State University
  • Ente Per Le Nuove Tecnologie L'energia e l'ambiente
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
  • Laser Zentrum Hannover e.V. (LZH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)229-237
Seitenumfang9
FachzeitschriftThin Solid Films
Jahrgang397
Ausgabenummer1-2
PublikationsstatusVeröffentlicht - 12 Okt. 2001
Extern publiziertJa

Abstract

Spectroscopic ellipsometry is a sensitive and reliable diagnostic tool for the optical properties of thin films and multi-layer coatings. In this paper we have derived new formulas permitting qualitative and quantitative analysis of the surface micro-roughness in the case where the refractive index of the film is close to that of the substrate. Theoretical results are applied to the developing of experimental data for lanthanum fluoride and magnesium fluoride thin films.

ASJC Scopus Sachgebiete

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Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry. / Tikhonravov, Alexander V.; Trubetskov, Michael K.; Krasilnikova, Anna V. et al.
in: Thin Solid Films, Jahrgang 397, Nr. 1-2, 12.10.2001, S. 229-237.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Tikhonravov, AV, Trubetskov, MK, Krasilnikova, AV, Masetti, E, Duparré, A, Quesnel, E & Ristau, D 2001, 'Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry', Thin Solid Films, Jg. 397, Nr. 1-2, S. 229-237. https://doi.org/10.1016/S0040-6090(01)01421-3
Tikhonravov, A. V., Trubetskov, M. K., Krasilnikova, A. V., Masetti, E., Duparré, A., Quesnel, E., & Ristau, D. (2001). Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry. Thin Solid Films, 397(1-2), 229-237. https://doi.org/10.1016/S0040-6090(01)01421-3
Tikhonravov AV, Trubetskov MK, Krasilnikova AV, Masetti E, Duparré A, Quesnel E et al. Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry. Thin Solid Films. 2001 Okt 12;397(1-2):229-237. doi: 10.1016/S0040-6090(01)01421-3
Tikhonravov, Alexander V. ; Trubetskov, Michael K. ; Krasilnikova, Anna V. et al. / Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry. in: Thin Solid Films. 2001 ; Jahrgang 397, Nr. 1-2. S. 229-237.
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AU - Tikhonravov, Alexander V.

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AU - Krasilnikova, Anna V.

AU - Masetti, Enrico

AU - Duparré, Angela

AU - Quesnel, E.

AU - Ristau, Detlev

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N2 - Spectroscopic ellipsometry is a sensitive and reliable diagnostic tool for the optical properties of thin films and multi-layer coatings. In this paper we have derived new formulas permitting qualitative and quantitative analysis of the surface micro-roughness in the case where the refractive index of the film is close to that of the substrate. Theoretical results are applied to the developing of experimental data for lanthanum fluoride and magnesium fluoride thin films.

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