Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Thin Films IV |
| Publikationsstatus | Veröffentlicht - 4 Okt. 2011 |
| Veranstaltung | Advances in Optical Thin Films IV - Marseille, Frankreich Dauer: 5 Sept. 2011 → 7 Sept. 2011 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8168 |
| ISSN (Print) | 0277-786X |
Abstract
Ion beam sputtering (IBS) is a well-established process to manufacture lowest loss coatings of highest complexity of spectral behavior. Nevertheless, the losses due to absorption in the bulk materials are still orders of magnitude lower than in the corresponding coatings, indicating that a further optimization of the process is possible. Such an improvement in quality requires a more detailed knowledge of the correlation between the process parameters and the coating quality. The present paper reports on a preliminary study based on a parameterization strategy for IBS processes. The propagation properties of the ion beam were investigated in detail, where both, the total dissipation of energy and the argon ion velocity distribution of the beam were measured and analyzed. Furthermore, research was concentrated on the sputtered material considering the dependence of the optical losses of the deposited dielectric layers on the physical properties of the adatoms. The energy distribution and the charge state of the material particles were investigated with respect to the implementation of a phase separating IBS process.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Advances in Optical Thin Films IV. 2011. 1 (Proceedings of SPIE - The International Society for Optical Engineering; Band 8168).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Investigation of ion beam properties and coating material during IBS
AU - Jupé, M.
AU - Malobabic, S.
AU - Schmitz, Carsten
AU - Gouldieff, Céline
AU - Steffen, H.
AU - Wiese, R.
AU - Ristau, Detlev
PY - 2011/10/4
Y1 - 2011/10/4
N2 - Ion beam sputtering (IBS) is a well-established process to manufacture lowest loss coatings of highest complexity of spectral behavior. Nevertheless, the losses due to absorption in the bulk materials are still orders of magnitude lower than in the corresponding coatings, indicating that a further optimization of the process is possible. Such an improvement in quality requires a more detailed knowledge of the correlation between the process parameters and the coating quality. The present paper reports on a preliminary study based on a parameterization strategy for IBS processes. The propagation properties of the ion beam were investigated in detail, where both, the total dissipation of energy and the argon ion velocity distribution of the beam were measured and analyzed. Furthermore, research was concentrated on the sputtered material considering the dependence of the optical losses of the deposited dielectric layers on the physical properties of the adatoms. The energy distribution and the charge state of the material particles were investigated with respect to the implementation of a phase separating IBS process.
AB - Ion beam sputtering (IBS) is a well-established process to manufacture lowest loss coatings of highest complexity of spectral behavior. Nevertheless, the losses due to absorption in the bulk materials are still orders of magnitude lower than in the corresponding coatings, indicating that a further optimization of the process is possible. Such an improvement in quality requires a more detailed knowledge of the correlation between the process parameters and the coating quality. The present paper reports on a preliminary study based on a parameterization strategy for IBS processes. The propagation properties of the ion beam were investigated in detail, where both, the total dissipation of energy and the argon ion velocity distribution of the beam were measured and analyzed. Furthermore, research was concentrated on the sputtered material considering the dependence of the optical losses of the deposited dielectric layers on the physical properties of the adatoms. The energy distribution and the charge state of the material particles were investigated with respect to the implementation of a phase separating IBS process.
UR - http://www.scopus.com/inward/record.url?scp=80455131122&partnerID=8YFLogxK
U2 - 10.1117/12.905363
DO - 10.1117/12.905363
M3 - Conference contribution
AN - SCOPUS:80455131122
SN - 9780819487940
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films IV
T2 - Advances in Optical Thin Films IV
Y2 - 5 September 2011 through 7 September 2011
ER -