Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • H. Blaschke
  • Nils Beermann
  • Henrik Ehlers
  • Detlev Ristau
  • Martin Bischoff
  • Dieter Gäbler
  • N. Kaiser
  • Ansgar Matern
  • D. Wulff-Molder

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • Coherent GmbH
  • Korth Kristalle GmbH
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksLaser-induced damage in optical materials: 2008
Untertitel40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
ISBN (Print)978-0-8194-7366-0
PublikationsstatusVeröffentlicht - 30 Dez. 2008
Extern publiziertJa
Veranstaltung40th Annual Boulder Damage Symposium - Laser-Induced Damage in Optical Materials: 2008 - Boulder, CO, USA / Vereinigte Staaten
Dauer: 22 Sept. 200824 Sept. 2008

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band7132
ISSN (Print)0277-786X

Abstract

In many applications of ArF-excimer lasers, a specific degradation effect is observed for the CaF2 outcoupling windows which starts assumedly at the rear surface and results in a characteristic damage morphology. In the present study, this degradation mechanism is examined in a measurement series involving a variety of window samples and irradiation sequences in an excimer laser with typical numbers of up to 2 × 108 pulses for each component. The irradiated samples were inspected by scanning spectrophotometry, TOF-SIMS, electron microscopy and other analytical techniques in order to clarify the underlying degradation mechanisms. On the basis of the experimental findings, coating strategies will be outlined to improve the lifetime of CaF2 - output couplers in 193 nm excimer lasers.

ASJC Scopus Sachgebiete

Zitieren

Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm. / Blaschke, H.; Beermann, Nils; Ehlers, Henrik et al.
Laser-induced damage in optical materials: 2008: 40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado. Bellingham: SPIE, 2008. 71321A (Proceedings of SPIE - The International Society for Optical Engineering; Band 7132).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Blaschke, H, Beermann, N, Ehlers, H, Ristau, D, Bischoff, M, Gäbler, D, Kaiser, N, Matern, A & Wulff-Molder, D 2008, Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm. in Laser-induced damage in optical materials: 2008: 40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado., 71321A, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 7132, SPIE, Bellingham, 40th Annual Boulder Damage Symposium - Laser-Induced Damage in Optical Materials: 2008, Boulder, CO, USA / Vereinigte Staaten, 22 Sept. 2008. https://doi.org/10.1117/12.804428
Blaschke, H., Beermann, N., Ehlers, H., Ristau, D., Bischoff, M., Gäbler, D., Kaiser, N., Matern, A., & Wulff-Molder, D. (2008). Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm. In Laser-induced damage in optical materials: 2008: 40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado Artikel 71321A (Proceedings of SPIE - The International Society for Optical Engineering; Band 7132). SPIE. https://doi.org/10.1117/12.804428
Blaschke H, Beermann N, Ehlers H, Ristau D, Bischoff M, Gäbler D et al. Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm. in Laser-induced damage in optical materials: 2008: 40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado. Bellingham: SPIE. 2008. 71321A. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.804428
Blaschke, H. ; Beermann, Nils ; Ehlers, Henrik et al. / Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm. Laser-induced damage in optical materials: 2008: 40th Annual Boulder Damage Symposium proceedings ; 22 - 24 September 2008, Boulder, Colorado. Bellingham : SPIE, 2008. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "In many applications of ArF-excimer lasers, a specific degradation effect is observed for the CaF2 outcoupling windows which starts assumedly at the rear surface and results in a characteristic damage morphology. In the present study, this degradation mechanism is examined in a measurement series involving a variety of window samples and irradiation sequences in an excimer laser with typical numbers of up to 2 × 108 pulses for each component. The irradiated samples were inspected by scanning spectrophotometry, TOF-SIMS, electron microscopy and other analytical techniques in order to clarify the underlying degradation mechanisms. On the basis of the experimental findings, coating strategies will be outlined to improve the lifetime of CaF2 - output couplers in 193 nm excimer lasers.",
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AU - Beermann, Nils

AU - Ehlers, Henrik

AU - Ristau, Detlev

AU - Bischoff, Martin

AU - Gäbler, Dieter

AU - Kaiser, N.

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