Details
Originalsprache | Englisch |
---|---|
Titel des Sammelwerks | ECS Transactions - Physics and Technology of High-k Gate Dielectrics 7 |
Herausgeber (Verlag) | Electrochemical Society, Inc. |
Seiten | 353-358 |
Seitenumfang | 6 |
Auflage | 6 |
ISBN (elektronisch) | 9781607680932 |
ISBN (Print) | 9781566777438 |
Publikationsstatus | Veröffentlicht - 2009 |
Veranstaltung | 7th International Symposium on High Dielectric Constant Materials and Gate Stacks - 216th Meeting of the Electrochemical Society - Vienna, Österreich Dauer: 5 Okt. 2009 → 7 Okt. 2009 |
Publikationsreihe
Name | ECS Transactions |
---|---|
Nummer | 6 |
Band | 25 |
ISSN (Print) | 1938-5862 |
ISSN (elektronisch) | 1938-6737 |
Abstract
The paper presents the results of electrical characterization of the interface and bulk properties of high-k Gd2O3 and Nd 2O3 dielectrics epitaxially grown on silicon substrates. The limitations of the conductance technique for correct determination of the interface state density due to the presence of leakage currents through the dielectric are discussed. The charge carrier transport through the dielectric film was found to occur via the variable-range hopping conductance mechanism.
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ECS Transactions - Physics and Technology of High-k Gate Dielectrics 7. 6. Aufl. Electrochemical Society, Inc., 2009. S. 353-358 (ECS Transactions; Band 25, Nr. 6).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Interface and Bulk Properties of MBE-Grown Rare-Earth Metal Oxides on Silicon
AU - Gomeniuk, Y. Y.
AU - Gomeniuk, Y. V.
AU - Nazarov, A. N.
AU - Lysenko, V. S.
AU - Osten, H. J.
AU - Laha, A.
PY - 2009
Y1 - 2009
N2 - The paper presents the results of electrical characterization of the interface and bulk properties of high-k Gd2O3 and Nd 2O3 dielectrics epitaxially grown on silicon substrates. The limitations of the conductance technique for correct determination of the interface state density due to the presence of leakage currents through the dielectric are discussed. The charge carrier transport through the dielectric film was found to occur via the variable-range hopping conductance mechanism.
AB - The paper presents the results of electrical characterization of the interface and bulk properties of high-k Gd2O3 and Nd 2O3 dielectrics epitaxially grown on silicon substrates. The limitations of the conductance technique for correct determination of the interface state density due to the presence of leakage currents through the dielectric are discussed. The charge carrier transport through the dielectric film was found to occur via the variable-range hopping conductance mechanism.
UR - http://www.scopus.com/inward/record.url?scp=76549105494&partnerID=8YFLogxK
U2 - 10.1149/1.3206634
DO - 10.1149/1.3206634
M3 - Conference contribution
AN - SCOPUS:76549105494
SN - 9781566777438
T3 - ECS Transactions
SP - 353
EP - 358
BT - ECS Transactions - Physics and Technology of High-k Gate Dielectrics 7
PB - Electrochemical Society, Inc.
T2 - 7th International Symposium on High Dielectric Constant Materials and Gate Stacks - 216th Meeting of the Electrochemical Society
Y2 - 5 October 2009 through 7 October 2009
ER -