Details
Originalsprache | Englisch |
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Titel des Sammelwerks | Laser Induced Damage in Optical Materials |
Untertitel | 1984 |
Seiten | 298-312 |
Seitenumfang | 15 |
Publikationsstatus | Veröffentlicht - 1986 |
Veranstaltung | Laser Induced Damage in Optical Materials 1984 - Boulder, USA / Vereinigte Staaten Dauer: 15 Okt. 1984 → 17 Okt. 1984 |
Publikationsreihe
Name | National Bureau of Standards, Special Publication |
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Abstract
The authors describe an infrared line scanning technique for measuring the temporal and spatial development of a temperature field which is generated by a high power cw Nd-laser on the surface of a coated sample. A theoretical model based on the solution of the differential equation of heat transport for an instantaneous point source is discussed. In this theory the optical and thermal properties of a laser heated single layer are related to its temperature field. Investigations on a temperature calibration technique are made in order to rule out the effect of different emissivities of the coating materials under test. Interface and bulk absorption of single layers and multilayer stacks are measured and related to the laser damage threshold attained from 15 ns pulses at 1. 064 mu m. The layers are produced by e-beam evaporation and by ion-beam assisted deposition. Results are given on TiO//2, Ta//2O//5, HfO//2, Al//2O//3 and SiO//2.
ASJC Scopus Sachgebiete
- Ingenieurwesen (insg.)
- Allgemeiner Maschinenbau
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Laser Induced Damage in Optical Materials: 1984. 1986. S. 298-312 (National Bureau of Standards, Special Publication).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm
AU - Ristau, Detlev
AU - Dang, X. C.
AU - Ebert, Jürgen
PY - 1986
Y1 - 1986
N2 - The authors describe an infrared line scanning technique for measuring the temporal and spatial development of a temperature field which is generated by a high power cw Nd-laser on the surface of a coated sample. A theoretical model based on the solution of the differential equation of heat transport for an instantaneous point source is discussed. In this theory the optical and thermal properties of a laser heated single layer are related to its temperature field. Investigations on a temperature calibration technique are made in order to rule out the effect of different emissivities of the coating materials under test. Interface and bulk absorption of single layers and multilayer stacks are measured and related to the laser damage threshold attained from 15 ns pulses at 1. 064 mu m. The layers are produced by e-beam evaporation and by ion-beam assisted deposition. Results are given on TiO//2, Ta//2O//5, HfO//2, Al//2O//3 and SiO//2.
AB - The authors describe an infrared line scanning technique for measuring the temporal and spatial development of a temperature field which is generated by a high power cw Nd-laser on the surface of a coated sample. A theoretical model based on the solution of the differential equation of heat transport for an instantaneous point source is discussed. In this theory the optical and thermal properties of a laser heated single layer are related to its temperature field. Investigations on a temperature calibration technique are made in order to rule out the effect of different emissivities of the coating materials under test. Interface and bulk absorption of single layers and multilayer stacks are measured and related to the laser damage threshold attained from 15 ns pulses at 1. 064 mu m. The layers are produced by e-beam evaporation and by ion-beam assisted deposition. Results are given on TiO//2, Ta//2O//5, HfO//2, Al//2O//3 and SiO//2.
UR - http://www.scopus.com/inward/record.url?scp=0022959115&partnerID=8YFLogxK
U2 - 10.1520/STP23131S
DO - 10.1520/STP23131S
M3 - Conference contribution
AN - SCOPUS:0022959115
T3 - National Bureau of Standards, Special Publication
SP - 298
EP - 312
BT - Laser Induced Damage in Optical Materials
T2 - Laser Induced Damage in Optical Materials 1984
Y2 - 15 October 1984 through 17 October 1984
ER -