Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI |
| Herausgeber/-innen | Georg von Freymann, Eva Blasco, Debashis Chanda |
| Herausgeber (Verlag) | SPIE |
| ISBN (elektronisch) | 9781510659711 |
| Publikationsstatus | Veröffentlicht - 15 März 2023 |
| Veranstaltung | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023 - San Francisco, USA / Vereinigte Staaten Dauer: 28 Jan. 2023 → 3 Feb. 2023 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 12433 |
| ISSN (Print) | 0277-786X |
| ISSN (elektronisch) | 1996-756X |
Abstract
In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. Hrsg. / Georg von Freymann; Eva Blasco; Debashis Chanda. SPIE, 2023. 124330G (Proceedings of SPIE - The International Society for Optical Engineering; Band 12433).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production
AU - Zheng, Lei
AU - Günther, Axel
AU - Caspary, Reinhard
AU - Kowalsky, Wolfgang
AU - Roth, Bernhard
N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).
PY - 2023/3/15
Y1 - 2023/3/15
N2 - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
AB - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
KW - high-resolution structuring
KW - scalable production
KW - two-photon polymerization
KW - UV-nanoimprint lithography
UR - http://www.scopus.com/inward/record.url?scp=85159778837&partnerID=8YFLogxK
U2 - 10.1117/12.2648030
DO - 10.1117/12.2648030
M3 - Conference contribution
AN - SCOPUS:85159778837
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI
A2 - von Freymann, Georg
A2 - Blasco, Eva
A2 - Chanda, Debashis
PB - SPIE
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023
Y2 - 28 January 2023 through 3 February 2023
ER -