Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Eric Eva
  • Klaus R. Mann
  • Uwe B. Schallenberg
  • Norbert Kaiser
  • Rainer Henking
  • Detlev Ristau

Externe Organisationen

  • Laser-Laboratorium Göttingen e.V. (LLG)
  • Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks27th Annual Boulder Damage Symposium
UntertitelLaser-Induced Damage in Optical Materials: 1995
ErscheinungsortBellingham
Herausgeber (Verlag)SPIE
Seiten499-510
Seitenumfang12
ISBN (Print)0-8194-2089-1
PublikationsstatusVeröffentlicht - 27 Mai 1996
Extern publiziertJa
Veranstaltung27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995 - Boulder, CO, USA / Vereinigte Staaten
Dauer: 30 Okt. 1995 → 30 Okt. 1995

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Herausgeber (Verlag)SPIE
Band2714
ISSN (Print)0277-786X

Abstract

KrF-laser induced damage thresholds (LIDT) of HR stacks were investigated as a function of the number of quarterwave layers. The findings were interpreted in terms of calorimetric absorption measurements and scatter defect density counts as well as an analysis of the standing wave electric field. Higher numbers of high-purity Al2O3/SiO2 layers resulted in enhanced LIDT by shielding the substrate surface increasingly well. Contrary to this, LIDT decreased with increasing numbers of e-beam evaporated LaF3/MgF2 layers. This was accompanied by elevated absorptance, defect density and conditionability at higher stack numbers.

ASJC Scopus Sachgebiete

Zitieren

Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm. / Eva, Eric; Mann, Klaus R.; Schallenberg, Uwe B. et al.
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995. Bellingham: SPIE, 1996. S. 499-510 (Proceedings of SPIE - The International Society for Optical Engineering; Band 2714).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Eva, E, Mann, KR, Schallenberg, UB, Kaiser, N, Henking, R & Ristau, D 1996, Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm. in 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995. Proceedings of SPIE - The International Society for Optical Engineering, Bd. 2714, SPIE, Bellingham, S. 499-510, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, Boulder, CO, USA / Vereinigte Staaten, 30 Okt. 1995. https://doi.org/10.1117/12.240365
Eva, E., Mann, K. R., Schallenberg, U. B., Kaiser, N., Henking, R., & Ristau, D. (1996). Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm. In 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995 (S. 499-510). (Proceedings of SPIE - The International Society for Optical Engineering; Band 2714). SPIE. https://doi.org/10.1117/12.240365
Eva E, Mann KR, Schallenberg UB, Kaiser N, Henking R, Ristau D. Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm. in 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995. Bellingham: SPIE. 1996. S. 499-510. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.240365
Eva, Eric ; Mann, Klaus R. ; Schallenberg, Uwe B. et al. / Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm. 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995. Bellingham : SPIE, 1996. S. 499-510 (Proceedings of SPIE - The International Society for Optical Engineering).
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AU - Eva, Eric

AU - Mann, Klaus R.

AU - Schallenberg, Uwe B.

AU - Kaiser, Norbert

AU - Henking, Rainer

AU - Ristau, Detlev

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KW - Conditioning

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