TY - JOUR

T1 - Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

AU - Sakiew, Wjatscheslaw

AU - Schrameyer, Stefan

AU - Jupé, Marco

AU - Schwerdtner, Philippe

AU - Erhart, Nick

AU - Starke, Kai

AU - Ristau, Detlev

N1 - Funding information: The authors are grateful to the German Federal Ministry of Education and Research (Bundesministerium für Bildung und Forschung, BMBF) for the financial support of the research project PluTO plus (contract no. 13N13207). Furthermore, the authors want to thank Dr. Benjamin Lotz (GIESS GmbH) for preparation of an ion optic with an elliptical shaped beamlet pattern and the authors want to thank the referees for valuable comments on the manuscript.

PY - 2019/5/10

Y1 - 2019/5/10

N2 - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.

AB - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.

KW - Broad ion beam

KW - Industrial scale coating process

KW - Ion beam sputter deposition

KW - Optical coatings

KW - Tantalum pentoxide

KW - Thickness distribution

KW - Titanium dioxide

UR - http://www.scopus.com/inward/record.url?scp=85065735751&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2019.05.027

DO - 10.1016/j.tsf.2019.05.027

M3 - Article

AN - SCOPUS:85065735751

VL - 682

SP - 109

EP - 120

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -