Individually controlled multi-focus laser processing for two-photon polymerization

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • Kotaro Obata
  • Jürgen Koch
  • Boris N. Chichkov

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksLaser Applications in Microelectronic and Optoelectronic Manufacturing XV
PublikationsstatusVeröffentlicht - 17 Feb. 2010
Extern publiziertJa
VeranstaltungLaser Applications in Microelectronic and Optoelectronic Manufacturing XV - San Francisco, CA, USA / Vereinigte Staaten
Dauer: 25 Jan. 201028 Jan. 2010

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band7584
ISSN (Print)0277-786X

Abstract

A parallel processing of two-photon polymerization structuring is demonstrated with spatial light modulator. Spatial light modulator generates multi-focus spots on the sample surface via phase modulation technique controlled by computer generated hologram pattern. Each focus spot can be individually controlled in position and laser intensity with computer generated hologram pattern displayed on spatial light modulator. The multi-focus spots two-photon polymerization achieves the fabrication of asymmetric structure. Moreover, smooth sine curved polymerized line with amplitude of 5 μm and a period of 200 μm was obtained by fast switching of CGH pattern.

ASJC Scopus Sachgebiete

Zitieren

Individually controlled multi-focus laser processing for two-photon polymerization. / Obata, Kotaro; Koch, Jürgen; Chichkov, Boris N.
Laser Applications in Microelectronic and Optoelectronic Manufacturing XV. 2010. 75840L (Proceedings of SPIE - The International Society for Optical Engineering; Band 7584).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Obata, K, Koch, J & Chichkov, BN 2010, Individually controlled multi-focus laser processing for two-photon polymerization. in Laser Applications in Microelectronic and Optoelectronic Manufacturing XV., 75840L, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV, San Francisco, CA, USA / Vereinigte Staaten, 25 Jan. 2010. https://doi.org/10.1117/12.842117
Obata, K., Koch, J., & Chichkov, B. N. (2010). Individually controlled multi-focus laser processing for two-photon polymerization. In Laser Applications in Microelectronic and Optoelectronic Manufacturing XV Artikel 75840L (Proceedings of SPIE - The International Society for Optical Engineering; Band 7584). https://doi.org/10.1117/12.842117
Obata K, Koch J, Chichkov BN. Individually controlled multi-focus laser processing for two-photon polymerization. in Laser Applications in Microelectronic and Optoelectronic Manufacturing XV. 2010. 75840L. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.842117
Obata, Kotaro ; Koch, Jürgen ; Chichkov, Boris N. / Individually controlled multi-focus laser processing for two-photon polymerization. Laser Applications in Microelectronic and Optoelectronic Manufacturing XV. 2010. (Proceedings of SPIE - The International Society for Optical Engineering).
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AU - Koch, Jürgen

AU - Chichkov, Boris N.

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AB - A parallel processing of two-photon polymerization structuring is demonstrated with spatial light modulator. Spatial light modulator generates multi-focus spots on the sample surface via phase modulation technique controlled by computer generated hologram pattern. Each focus spot can be individually controlled in position and laser intensity with computer generated hologram pattern displayed on spatial light modulator. The multi-focus spots two-photon polymerization achieves the fabrication of asymmetric structure. Moreover, smooth sine curved polymerized line with amplitude of 5 μm and a period of 200 μm was obtained by fast switching of CGH pattern.

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KW - Femtosecond laser

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