Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Untertitel | 2011 |
| Publikationsstatus | Veröffentlicht - 29 Nov. 2011 |
| Extern publiziert | Ja |
| Veranstaltung | 43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011 - Boulder, CO, USA / Vereinigte Staaten Dauer: 18 Sept. 2010 → 21 Sept. 2010 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8190 |
| ISSN (Print) | 0277-786X |
Abstract
Significant effort is pursued for the development and optimization of lithography grade materials aiming for ultra-low optical losses. Nowadays, very sophisticated crystal growing techniques are available. The surface finish of these DUV substrates has to be considered in an analogous manner, as the performance of thin film optical coatings may directly be influenced by the surface composition. Using laser calorimetry according to ISO 11551, the treatment-dependent surface contribution to the overall absorption of lithography grade substrate materials is deduced. The sensitivity enhanced test setup allows for a detailed study at ultra-low fluences - typical for current deep ultraviolet lithography applications. The results on absorption measurements are supported by an innovative surface qualification method, deriving both, characteristics on roughness and near surface stoichiometry, which are the footprints of applied polishing methods and, further, handling conditions on the one hand side, and a consequence of cleaning procedures and dose dependent exposure to DUV-radiation on the other side.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. 81901T (Proceedings of SPIE - The International Society for Optical Engineering; Band 8190).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Impact of SiO 2 and CaF 2 surface composition on the absolute absorption at 193nm
AU - Balasa, Istvan
AU - Blaschke, H.
AU - Jensen, Lars
AU - Ristau, Detlev
PY - 2011/11/29
Y1 - 2011/11/29
N2 - Significant effort is pursued for the development and optimization of lithography grade materials aiming for ultra-low optical losses. Nowadays, very sophisticated crystal growing techniques are available. The surface finish of these DUV substrates has to be considered in an analogous manner, as the performance of thin film optical coatings may directly be influenced by the surface composition. Using laser calorimetry according to ISO 11551, the treatment-dependent surface contribution to the overall absorption of lithography grade substrate materials is deduced. The sensitivity enhanced test setup allows for a detailed study at ultra-low fluences - typical for current deep ultraviolet lithography applications. The results on absorption measurements are supported by an innovative surface qualification method, deriving both, characteristics on roughness and near surface stoichiometry, which are the footprints of applied polishing methods and, further, handling conditions on the one hand side, and a consequence of cleaning procedures and dose dependent exposure to DUV-radiation on the other side.
AB - Significant effort is pursued for the development and optimization of lithography grade materials aiming for ultra-low optical losses. Nowadays, very sophisticated crystal growing techniques are available. The surface finish of these DUV substrates has to be considered in an analogous manner, as the performance of thin film optical coatings may directly be influenced by the surface composition. Using laser calorimetry according to ISO 11551, the treatment-dependent surface contribution to the overall absorption of lithography grade substrate materials is deduced. The sensitivity enhanced test setup allows for a detailed study at ultra-low fluences - typical for current deep ultraviolet lithography applications. The results on absorption measurements are supported by an innovative surface qualification method, deriving both, characteristics on roughness and near surface stoichiometry, which are the footprints of applied polishing methods and, further, handling conditions on the one hand side, and a consequence of cleaning procedures and dose dependent exposure to DUV-radiation on the other side.
KW - CaF
KW - contamination
KW - DUV/VUV
KW - ISO11551
KW - laser calorimetry
KW - polishing
KW - SiO
KW - surface absorption
KW - XUV spectroscopy
UR - http://www.scopus.com/inward/record.url?scp=84856326248&partnerID=8YFLogxK
U2 - 10.1117/12.900042
DO - 10.1117/12.900042
M3 - Conference contribution
AN - SCOPUS:84856326248
SN - 9780819488237
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
T2 - 43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011
Y2 - 18 September 2010 through 21 September 2010
ER -