Details
Originalsprache | Englisch |
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Titel des Sammelwerks | 64th ARFTG Microwave Measurements Conference |
Untertitel | Digital Communications Systems Metrics, ARFTG 2004 |
Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers Inc. |
Seiten | 207-211 |
Seitenumfang | 5 |
ISBN (elektronisch) | 0780389522, 9780780389526 |
Publikationsstatus | Veröffentlicht - 2004 |
Veranstaltung | 64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004 - Orlando, USA / Vereinigte Staaten Dauer: 2 Dez. 2004 → 3 Dez. 2004 |
Publikationsreihe
Name | 64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004 |
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Abstract
In this paper, we investigate the impact of ground line position as well as the effects of conductive substrates with different conductivities of 10 S/m (low), 100 S/m (medium) and 10.000 S/m (high) on on-chip interconnects. Characteristic line parameters obtained from field calculations are validated with two-port network analyzer measurements of specially designed test structures in a frequency range up to 50 GHz.
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- RIS
64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004. Institute of Electrical and Electronics Engineers Inc., 2004. S. 207-211 1427600 (64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Impact of ground line position on CMOS interconnect behavior
AU - Faïez Ktata, M.
AU - Arz, Uwe
AU - Grabinski, Hartmut
AU - Fischer, Helmut
PY - 2004
Y1 - 2004
N2 - In this paper, we investigate the impact of ground line position as well as the effects of conductive substrates with different conductivities of 10 S/m (low), 100 S/m (medium) and 10.000 S/m (high) on on-chip interconnects. Characteristic line parameters obtained from field calculations are validated with two-port network analyzer measurements of specially designed test structures in a frequency range up to 50 GHz.
AB - In this paper, we investigate the impact of ground line position as well as the effects of conductive substrates with different conductivities of 10 S/m (low), 100 S/m (medium) and 10.000 S/m (high) on on-chip interconnects. Characteristic line parameters obtained from field calculations are validated with two-port network analyzer measurements of specially designed test structures in a frequency range up to 50 GHz.
UR - http://www.scopus.com/inward/record.url?scp=84935103907&partnerID=8YFLogxK
U2 - 10.1109/ARFTGF.2004.1427600
DO - 10.1109/ARFTGF.2004.1427600
M3 - Conference contribution
AN - SCOPUS:84935103907
T3 - 64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004
SP - 207
EP - 211
BT - 64th ARFTG Microwave Measurements Conference
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 64th ARFTG Microwave Measurements Conference: Digital Communications Systems Metrics, ARFTG 2004
Y2 - 2 December 2004 through 3 December 2004
ER -