Imaging techniques for the analysis of silicon wafers and solar cells

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autorschaft

  • K. Bothe
  • K. Ramspeck
  • D. Hinken
  • R. Brendel

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksECS Transactions - High Purity Silicon 10
Herausgeber (Verlag)Electrochemical Society, Inc.
Seiten63-78
Seitenumfang16
Auflage6
ISBN (Print)9781566776523
PublikationsstatusVeröffentlicht - 2009
Extern publiziertJa
VeranstaltungHigh Purity Silicon 10 - 214th ECS Meeting - Honolulu, HI, USA / Vereinigte Staaten
Dauer: 12 Okt. 200817 Okt. 2008

Publikationsreihe

NameECS Transactions
Nummer6
Band16
ISSN (Print)1938-5862
ISSN (elektronisch)1938-6737

Abstract

For large area devices a spatial analysis of local device and material parameters is essentially important. Imaging techniques allowing a fast and contactless analysis with a high spatial resolution have become a versatile characterization tool during the last decade. We present a comprehensive overview over the existing imaging techniques for the analysis of silicon wafers and solar cells utilizing different spectral ranges of photon emission. Additionally, we report on recent studies of local junction breakdown and the emission of light from solar cells under forward and reverse bias using luminescence imaging and dark lock-in thermography. Finally we present a calibration-free dynamic infrared carrier lifetime mapping (dynamic-ILM) technique, yielding images of the carrier lifetime of multi-crystalline silicon wafers within seconds.

ASJC Scopus Sachgebiete

Zitieren

Imaging techniques for the analysis of silicon wafers and solar cells. / Bothe, K.; Ramspeck, K.; Hinken, D. et al.
ECS Transactions - High Purity Silicon 10. 6. Aufl. Electrochemical Society, Inc., 2009. S. 63-78 (ECS Transactions; Band 16, Nr. 6).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Bothe, K, Ramspeck, K, Hinken, D & Brendel, R 2009, Imaging techniques for the analysis of silicon wafers and solar cells. in ECS Transactions - High Purity Silicon 10. 6 Aufl., ECS Transactions, Nr. 6, Bd. 16, Electrochemical Society, Inc., S. 63-78, High Purity Silicon 10 - 214th ECS Meeting, Honolulu, HI, USA / Vereinigte Staaten, 12 Okt. 2008. https://doi.org/10.1149/1.2980293
Bothe, K., Ramspeck, K., Hinken, D., & Brendel, R. (2009). Imaging techniques for the analysis of silicon wafers and solar cells. In ECS Transactions - High Purity Silicon 10 (6 Aufl., S. 63-78). (ECS Transactions; Band 16, Nr. 6). Electrochemical Society, Inc.. https://doi.org/10.1149/1.2980293
Bothe K, Ramspeck K, Hinken D, Brendel R. Imaging techniques for the analysis of silicon wafers and solar cells. in ECS Transactions - High Purity Silicon 10. 6 Aufl. Electrochemical Society, Inc. 2009. S. 63-78. (ECS Transactions; 6). doi: 10.1149/1.2980293
Bothe, K. ; Ramspeck, K. ; Hinken, D. et al. / Imaging techniques for the analysis of silicon wafers and solar cells. ECS Transactions - High Purity Silicon 10. 6. Aufl. Electrochemical Society, Inc., 2009. S. 63-78 (ECS Transactions; 6).
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Download

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AU - Bothe, K.

AU - Ramspeck, K.

AU - Hinken, D.

AU - Brendel, R.

PY - 2009

Y1 - 2009

N2 - For large area devices a spatial analysis of local device and material parameters is essentially important. Imaging techniques allowing a fast and contactless analysis with a high spatial resolution have become a versatile characterization tool during the last decade. We present a comprehensive overview over the existing imaging techniques for the analysis of silicon wafers and solar cells utilizing different spectral ranges of photon emission. Additionally, we report on recent studies of local junction breakdown and the emission of light from solar cells under forward and reverse bias using luminescence imaging and dark lock-in thermography. Finally we present a calibration-free dynamic infrared carrier lifetime mapping (dynamic-ILM) technique, yielding images of the carrier lifetime of multi-crystalline silicon wafers within seconds.

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