Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Thin Films II |
| Untertitel | 13 - 15 September 2005, Jena, Germany |
| Erscheinungsort | Bellingham |
| Herausgeber (Verlag) | SPIE |
| ISBN (Print) | 0-8194-5981-X |
| Publikationsstatus | Veröffentlicht - 4 Okt. 2005 |
| Extern publiziert | Ja |
| Veranstaltung | Advances in Optical Thin Films II - Jena, Deutschland Dauer: 13 Sept. 2005 → 15 Sept. 2005 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Herausgeber (Verlag) | SPIE |
| Band | 5963 |
| ISSN (Print) | 0277-786X |
Abstract
Fluoride materials like Magnesium fluoride and Lanthanum fluoride exhibit unique properties for applications in mirror and anti reflecting coatings in the VUV spectral range (120- 230 nm). These large band gap materials provide low absorption and a usable refractive index contrast. Common deposition methods are thermal evaporation and electron beam evaporation. A columnar microcrystalline structure with a significant porosity is observed for such coatings. Furthermore, a high sensitivity for contamination processes resulting in an increasing absorption is often perceived. Investigations of mirror systems exposed to a harsh environment like the storage ring free electron laser at ELETTRA show a rapid degradation in respect to a reduced reflectivity, an increased hydrocarbon contamination, and a formation of colour centres. An improved performance of the fluoride coatings could possibly be expected for films, which do not have the polycrystalline columnar structure. Ion beam sputtering deposition of fluoride materials demonstrated its applicability to deposit dense amorphous fluoride coatings down to 193 nm [1,2]. An IBS deposition plant with a Kaufman ion source, using a reactive fluorine environment, is used to grow fluoride layers with comparably low absorption values. Single and multilayer coatings were optically characterised after deposition, exposed to synchrotron radiation at ELETTRA, and characterized again after irradiation. However, the first set of irradiated multilayer mirrors showed a strong degradation of reflectivity and a strong hydrocarbon contamination. Colour centres were not observed.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Advances in Optical Thin Films II: 13 - 15 September 2005, Jena, Germany. Bellingham: SPIE, 2005. (Proceedings of SPIE - The International Society for Optical Engineering; Band 5963).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - IBS deposition of dense fluoride coatings for the vacuum ultraviolet free electron laser
AU - Günster, Stefan
AU - Görtz, Björn
AU - Ristau, Detlev
AU - Quesnel, E.
AU - Ravel, G.
AU - Trovó, Mauro
AU - Danailov, M.
PY - 2005/10/4
Y1 - 2005/10/4
N2 - Fluoride materials like Magnesium fluoride and Lanthanum fluoride exhibit unique properties for applications in mirror and anti reflecting coatings in the VUV spectral range (120- 230 nm). These large band gap materials provide low absorption and a usable refractive index contrast. Common deposition methods are thermal evaporation and electron beam evaporation. A columnar microcrystalline structure with a significant porosity is observed for such coatings. Furthermore, a high sensitivity for contamination processes resulting in an increasing absorption is often perceived. Investigations of mirror systems exposed to a harsh environment like the storage ring free electron laser at ELETTRA show a rapid degradation in respect to a reduced reflectivity, an increased hydrocarbon contamination, and a formation of colour centres. An improved performance of the fluoride coatings could possibly be expected for films, which do not have the polycrystalline columnar structure. Ion beam sputtering deposition of fluoride materials demonstrated its applicability to deposit dense amorphous fluoride coatings down to 193 nm [1,2]. An IBS deposition plant with a Kaufman ion source, using a reactive fluorine environment, is used to grow fluoride layers with comparably low absorption values. Single and multilayer coatings were optically characterised after deposition, exposed to synchrotron radiation at ELETTRA, and characterized again after irradiation. However, the first set of irradiated multilayer mirrors showed a strong degradation of reflectivity and a strong hydrocarbon contamination. Colour centres were not observed.
AB - Fluoride materials like Magnesium fluoride and Lanthanum fluoride exhibit unique properties for applications in mirror and anti reflecting coatings in the VUV spectral range (120- 230 nm). These large band gap materials provide low absorption and a usable refractive index contrast. Common deposition methods are thermal evaporation and electron beam evaporation. A columnar microcrystalline structure with a significant porosity is observed for such coatings. Furthermore, a high sensitivity for contamination processes resulting in an increasing absorption is often perceived. Investigations of mirror systems exposed to a harsh environment like the storage ring free electron laser at ELETTRA show a rapid degradation in respect to a reduced reflectivity, an increased hydrocarbon contamination, and a formation of colour centres. An improved performance of the fluoride coatings could possibly be expected for films, which do not have the polycrystalline columnar structure. Ion beam sputtering deposition of fluoride materials demonstrated its applicability to deposit dense amorphous fluoride coatings down to 193 nm [1,2]. An IBS deposition plant with a Kaufman ion source, using a reactive fluorine environment, is used to grow fluoride layers with comparably low absorption values. Single and multilayer coatings were optically characterised after deposition, exposed to synchrotron radiation at ELETTRA, and characterized again after irradiation. However, the first set of irradiated multilayer mirrors showed a strong degradation of reflectivity and a strong hydrocarbon contamination. Colour centres were not observed.
KW - Ion Beam Sputtering
KW - Radiation resistance
KW - Synchrotron radiation
KW - VUV characterisation
KW - VUV coatings
UR - http://www.scopus.com/inward/record.url?scp=33144467629&partnerID=8YFLogxK
U2 - 10.1117/12.625387
DO - 10.1117/12.625387
M3 - Conference contribution
AN - SCOPUS:33144467629
SN - 0-8194-5981-X
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films II
PB - SPIE
CY - Bellingham
T2 - Advances in Optical Thin Films II
Y2 - 13 September 2005 through 15 September 2005
ER -