Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Optical Thin Films V: New Developments |
| Untertitel | 30 July-1 August 1997, San Diego, California |
| Erscheinungsort | Bellingham |
| Herausgeber (Verlag) | SPIE |
| Seiten | 205-213 |
| Seitenumfang | 9 |
| ISBN (Print) | 0-8194-2555-9 |
| Publikationsstatus | Veröffentlicht - 1 Okt. 1997 |
| Extern publiziert | Ja |
| Veranstaltung | Optical Thin Films V: New Developments - San Diego, USA / Vereinigte Staaten Dauer: 30 Juli 1997 → 1 Aug. 1997 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Herausgeber (Verlag) | SPIE |
| Band | 3133 |
| ISSN (Print) | 0277-786X |
Abstract
A comparative study of different ion and plasma assisted physical vapor deposition processes at low temperature is reported. To work out a clear comparison of the different processes, the object of the study are single layers of different metal oxides like Ta2O5, TiO2, SiO2 and mixed oxides like H4 (Merck) deposited on glass and silicon substrates. Three different types of ion- (or plasma-respectively) sources are used: the cold cathode ion source from Denton (CC 104), the end hall ion source Mark II from CSC and the advanced plasma source from Leybold. Each of these processes is run under conditions concerning process parameters like bias, ion current, ion energy, beam characteristics and gas flow, which were understood to be optimized also to maintain long-term stability as realistic production conditions. The resulting metal oxide single layers are characterized by their optical properties, dispersion curves for NUV and VIS as well as absorption and scatter at discrete wavelengths. Also discussed are mechanical properties like hardness and adherence. A test method is presented which clearly shows the superior behavior of the IAD coatings.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Optical Thin Films V: New Developments: 30 July-1 August 1997, San Diego, California. Bellingham: SPIE, 1997. S. 205-213 (Proceedings of SPIE - The International Society for Optical Engineering; Band 3133).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - IAD of oxide coatings at low temperature
T2 - Optical Thin Films V: New Developments
AU - Niederwald, Hansjörg S.
AU - Kaiser, Norbert
AU - Schallenberg, Uwe B.
AU - Duparre, Angela
AU - Ristau, Detlev
AU - Kennedy, Michael
PY - 1997/10/1
Y1 - 1997/10/1
N2 - A comparative study of different ion and plasma assisted physical vapor deposition processes at low temperature is reported. To work out a clear comparison of the different processes, the object of the study are single layers of different metal oxides like Ta2O5, TiO2, SiO2 and mixed oxides like H4 (Merck) deposited on glass and silicon substrates. Three different types of ion- (or plasma-respectively) sources are used: the cold cathode ion source from Denton (CC 104), the end hall ion source Mark II from CSC and the advanced plasma source from Leybold. Each of these processes is run under conditions concerning process parameters like bias, ion current, ion energy, beam characteristics and gas flow, which were understood to be optimized also to maintain long-term stability as realistic production conditions. The resulting metal oxide single layers are characterized by their optical properties, dispersion curves for NUV and VIS as well as absorption and scatter at discrete wavelengths. Also discussed are mechanical properties like hardness and adherence. A test method is presented which clearly shows the superior behavior of the IAD coatings.
AB - A comparative study of different ion and plasma assisted physical vapor deposition processes at low temperature is reported. To work out a clear comparison of the different processes, the object of the study are single layers of different metal oxides like Ta2O5, TiO2, SiO2 and mixed oxides like H4 (Merck) deposited on glass and silicon substrates. Three different types of ion- (or plasma-respectively) sources are used: the cold cathode ion source from Denton (CC 104), the end hall ion source Mark II from CSC and the advanced plasma source from Leybold. Each of these processes is run under conditions concerning process parameters like bias, ion current, ion energy, beam characteristics and gas flow, which were understood to be optimized also to maintain long-term stability as realistic production conditions. The resulting metal oxide single layers are characterized by their optical properties, dispersion curves for NUV and VIS as well as absorption and scatter at discrete wavelengths. Also discussed are mechanical properties like hardness and adherence. A test method is presented which clearly shows the superior behavior of the IAD coatings.
KW - Ion assisted deposition
KW - Low temperature deposition
KW - Optical constants
KW - Scatter
KW - Thin oxide films
UR - http://www.scopus.com/inward/record.url?scp=0031288519&partnerID=8YFLogxK
U2 - 10.1117/12.290194
DO - 10.1117/12.290194
M3 - Conference contribution
AN - SCOPUS:0031288519
SN - 0-8194-2555-9
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 205
EP - 213
BT - Optical Thin Films V: New Developments
PB - SPIE
CY - Bellingham
Y2 - 30 July 1997 through 1 August 1997
ER -