Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Bernhard Von Boehn
  • Tevfik O. Menteş
  • Andrea Locatelli
  • Alessandro Sala
  • Ronald Imbihl

Organisationseinheiten

Externe Organisationen

  • Sincrotrone Trieste
  • Istituto Nazionale di Fisica Nucleare (INFN)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)19774-19785
Seitenumfang12
FachzeitschriftJournal of Physical Chemistry C
Jahrgang121
Ausgabenummer36
PublikationsstatusVeröffentlicht - 14 Sept. 2017

Abstract

We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 x n) and (n x 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 x 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component. (Graph Presented).

ASJC Scopus Sachgebiete

Zitieren

Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface. / Von Boehn, Bernhard; Menteş, Tevfik O.; Locatelli, Andrea et al.
in: Journal of Physical Chemistry C, Jahrgang 121, Nr. 36, 14.09.2017, S. 19774-19785.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Von Boehn, B, Menteş, TO, Locatelli, A, Sala, A & Imbihl, R 2017, 'Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface', Journal of Physical Chemistry C, Jg. 121, Nr. 36, S. 19774-19785. https://doi.org/10.1021/acs.jpcc.7b04809
Von Boehn, B., Menteş, T. O., Locatelli, A., Sala, A., & Imbihl, R. (2017). Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface. Journal of Physical Chemistry C, 121(36), 19774-19785. https://doi.org/10.1021/acs.jpcc.7b04809
Von Boehn B, Menteş TO, Locatelli A, Sala A, Imbihl R. Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface. Journal of Physical Chemistry C. 2017 Sep 14;121(36):19774-19785. doi: 10.1021/acs.jpcc.7b04809
Von Boehn, Bernhard ; Menteş, Tevfik O. ; Locatelli, Andrea et al. / Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface. in: Journal of Physical Chemistry C. 2017 ; Jahrgang 121, Nr. 36. S. 19774-19785.
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AU - Von Boehn, Bernhard

AU - Menteş, Tevfik O.

AU - Locatelli, Andrea

AU - Sala, Alessandro

AU - Imbihl, Ronald

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N2 - We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 x n) and (n x 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 x 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component. (Graph Presented).

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