Grazing-incidence X-ray diffraction investigation of the coincidence site lattice of the Ge/Si(001) system

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OriginalspracheEnglisch
Seiten (von - bis)1212-1216
Seitenumfang5
FachzeitschriftJournal of Applied Crystallography
Jahrgang53
PublikationsstatusVeröffentlicht - 1 Okt. 2020

Abstract

The Ge/Si(001) system has been analysed by grazing-incidence X-ray diffraction on a standard laboratory X-ray diffraction tool. A periodic array of interfacial edge dislocations forms a coincidence site lattice (CSL) which yields equidistantly spaced satellite peaks close to Bragg peaks of the Ge layer and Si substrate. The diffraction behaviour of the CSL was analysed using 2θ/φ scans along [100], [110] and [310] directions as well as azimuthal φ scans which revealed a 90° angular symmetry of the CSL. Additionally, different layer thicknesses, from 10 to 580 nm, were analysed, focusing on the dependence of layer thickness on the glancing angles of the satellite peaks. This method provides the ability to analyse whether or not epitaxially grown layers exhibit a periodic array of dislocations, and gain information about the orientation of the interfacial edge dislocations.

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Grazing-incidence X-ray diffraction investigation of the coincidence site lattice of the Ge/Si(001) system. / Barnscheidt, Yvo; Schmidt, Jan; Osten, H. Jörg.
in: Journal of Applied Crystallography, Jahrgang 53, 01.10.2020, S. 1212-1216.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Barnscheidt Y, Schmidt J, Osten HJ. Grazing-incidence X-ray diffraction investigation of the coincidence site lattice of the Ge/Si(001) system. Journal of Applied Crystallography. 2020 Okt 1;53:1212-1216. doi: 10.1107/S1600576720009255, 10.15488/12623
Barnscheidt, Yvo ; Schmidt, Jan ; Osten, H. Jörg. / Grazing-incidence X-ray diffraction investigation of the coincidence site lattice of the Ge/Si(001) system. in: Journal of Applied Crystallography. 2020 ; Jahrgang 53. S. 1212-1216.
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title = "Grazing-incidence X-ray diffraction investigation of the coincidence site lattice of the Ge/Si(001) system",
abstract = "The Ge/Si(001) system has been analysed by grazing-incidence X-ray diffraction on a standard laboratory X-ray diffraction tool. A periodic array of interfacial edge dislocations forms a coincidence site lattice (CSL) which yields equidistantly spaced satellite peaks close to Bragg peaks of the Ge layer and Si substrate. The diffraction behaviour of the CSL was analysed using 2θ/φ scans along [100], [110] and [310] directions as well as azimuthal φ scans which revealed a 90° angular symmetry of the CSL. Additionally, different layer thicknesses, from 10 to 580 nm, were analysed, focusing on the dependence of layer thickness on the glancing angles of the satellite peaks. This method provides the ability to analyse whether or not epitaxially grown layers exhibit a periodic array of dislocations, and gain information about the orientation of the interfacial edge dislocations. ",
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author = "Yvo Barnscheidt and Jan Schmidt and Osten, {H. J{\"o}rg}",
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AU - Barnscheidt, Yvo

AU - Schmidt, Jan

AU - Osten, H. Jörg

N1 - Funding information: We would like to express sincere gratitude to the Deutsche Forschungsgemeinschaft for funding our research under project No. 389061803.

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N2 - The Ge/Si(001) system has been analysed by grazing-incidence X-ray diffraction on a standard laboratory X-ray diffraction tool. A periodic array of interfacial edge dislocations forms a coincidence site lattice (CSL) which yields equidistantly spaced satellite peaks close to Bragg peaks of the Ge layer and Si substrate. The diffraction behaviour of the CSL was analysed using 2θ/φ scans along [100], [110] and [310] directions as well as azimuthal φ scans which revealed a 90° angular symmetry of the CSL. Additionally, different layer thicknesses, from 10 to 580 nm, were analysed, focusing on the dependence of layer thickness on the glancing angles of the satellite peaks. This method provides the ability to analyse whether or not epitaxially grown layers exhibit a periodic array of dislocations, and gain information about the orientation of the interfacial edge dislocations.

AB - The Ge/Si(001) system has been analysed by grazing-incidence X-ray diffraction on a standard laboratory X-ray diffraction tool. A periodic array of interfacial edge dislocations forms a coincidence site lattice (CSL) which yields equidistantly spaced satellite peaks close to Bragg peaks of the Ge layer and Si substrate. The diffraction behaviour of the CSL was analysed using 2θ/φ scans along [100], [110] and [310] directions as well as azimuthal φ scans which revealed a 90° angular symmetry of the CSL. Additionally, different layer thicknesses, from 10 to 580 nm, were analysed, focusing on the dependence of layer thickness on the glancing angles of the satellite peaks. This method provides the ability to analyse whether or not epitaxially grown layers exhibit a periodic array of dislocations, and gain information about the orientation of the interfacial edge dislocations.

KW - Coincidence site lattices

KW - Dislocation network

KW - Ge/Si

KW - Grazing incidence

KW - Heteroepitaxy

KW - X-ray diffraction

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