Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • L. A. Emmert
  • Duy Nguyen
  • Mark Mero
  • Wolfgang Rudolph
  • Detlev Ristau
  • Kai Starke
  • Marco Jupé
  • C. S. Menoni
  • D. Patel
  • E. Krous

Externe Organisationen

  • University of New Mexico
  • Laser Zentrum Hannover e.V. (LZH)
  • Colorado State University
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Untertitel2009
PublikationsstatusVeröffentlicht - 31 Dez. 2009
Extern publiziertJa
Veranstaltung41st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2009 - Boulder, CO, USA / Vereinigte Staaten
Dauer: 21 Sept. 2009 → 23 Sept. 2009

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band7504
ISSN (Print)0277-786X

Abstract

In this contribution we will summarize the fundamental mechanisms that lead to subpicosecond laser damage in dielectric films, discuss the resulting scaling laws of single pulse (1-on-1) damage with respect to pulse duration and bandgap, of the multiple pulse (S-on-1) damage threshold as a function of pulse number, and compare these findings to recent experimental results.

ASJC Scopus Sachgebiete

Zitieren

Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. / Emmert, L. A.; Nguyen, Duy; Mero, Mark et al.
41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. 75040P (Proceedings of SPIE - The International Society for Optical Engineering; Band 7504).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Emmert, LA, Nguyen, D, Mero, M, Rudolph, W, Ristau, D, Starke, K, Jupé, M, Menoni, CS, Patel, D & Krous, E 2009, Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. in 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009., 75040P, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 7504, 41st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2009, Boulder, CO, USA / Vereinigte Staaten, 21 Sept. 2009. https://doi.org/10.1117/12.836508
Emmert, L. A., Nguyen, D., Mero, M., Rudolph, W., Ristau, D., Starke, K., Jupé, M., Menoni, C. S., Patel, D., & Krous, E. (2009). Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. In 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009 Artikel 75040P (Proceedings of SPIE - The International Society for Optical Engineering; Band 7504). https://doi.org/10.1117/12.836508
Emmert LA, Nguyen D, Mero M, Rudolph W, Ristau D, Starke K et al. Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. in 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. 75040P. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.836508
Emmert, L. A. ; Nguyen, Duy ; Mero, Mark et al. / Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. (Proceedings of SPIE - The International Society for Optical Engineering).
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AU - Emmert, L. A.

AU - Nguyen, Duy

AU - Mero, Mark

AU - Rudolph, Wolfgang

AU - Ristau, Detlev

AU - Starke, Kai

AU - Jupé, Marco

AU - Menoni, C. S.

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