Fundamental consideration of junction formation strategies for phosphorus-doped emitters with J0e < 10 fA/cm2

Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review

Autoren

  • Byungsul Min
  • Jan Krügener
  • Matthias Müller
  • Karsten Bothe
  • Rolf Brendel

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
  • SolarWorld Innovations GmbH
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)126-130
Seitenumfang5
FachzeitschriftEnergy Procedia
Jahrgang124
PublikationsstatusVeröffentlicht - 21 Sept. 2017
Veranstaltung7th International Conference on Silicon Photovoltaics, SiliconPV 2017 - Freiburg, Deutschland
Dauer: 3 Apr. 20175 Apr. 2017

Abstract

This work shows the potential of further optimization of phosphorus-doped emitters in p-type silicon solar cells. We investigate the impact of different combinations of phosphorus doping profiles and surface passivation qualities on the saturation current density J0e by considering boundary conditions based on published experimental data. Our simulation study shows that there are two possible ways to achieve J0e values below 10 fA/cm2. One is the reduction of the electrically active phosphorus concentration nsurf at the surface beneath 2×1019 cm-3 and simultaneously reducing the surface recombination velocity Sp to below 103 cm/s. The other contrarily increases nsurf to values of up to 1×1021 cm-3 while ensuring full activation of all phosphorus dopants. In the latter case, J0e values below 10 fA/cm2 seem possible, even for Sp = 107 cm/s which is equal to the thermal velocity.

ASJC Scopus Sachgebiete

Zitieren

Fundamental consideration of junction formation strategies for phosphorus-doped emitters with J0e < 10 fA/cm2. / Min, Byungsul; Krügener, Jan; Müller, Matthias et al.
in: Energy Procedia, Jahrgang 124, 21.09.2017, S. 126-130.

Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review

Min B, Krügener J, Müller M, Bothe K, Brendel R. Fundamental consideration of junction formation strategies for phosphorus-doped emitters with J0e < 10 fA/cm2. Energy Procedia. 2017 Sep 21;124:126-130. doi: 10.1016/j.egypro.2017.09.323
Min, Byungsul ; Krügener, Jan ; Müller, Matthias et al. / Fundamental consideration of junction formation strategies for phosphorus-doped emitters with J0e < 10 fA/cm2. in: Energy Procedia. 2017 ; Jahrgang 124. S. 126-130.
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abstract = "This work shows the potential of further optimization of phosphorus-doped emitters in p-type silicon solar cells. We investigate the impact of different combinations of phosphorus doping profiles and surface passivation qualities on the saturation current density J0e by considering boundary conditions based on published experimental data. Our simulation study shows that there are two possible ways to achieve J0e values below 10 fA/cm2. One is the reduction of the electrically active phosphorus concentration nsurf at the surface beneath 2×1019 cm-3 and simultaneously reducing the surface recombination velocity Sp to below 103 cm/s. The other contrarily increases nsurf to values of up to 1×1021 cm-3 while ensuring full activation of all phosphorus dopants. In the latter case, J0e values below 10 fA/cm2 seem possible, even for Sp = 107 cm/s which is equal to the thermal velocity.",
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Download

TY - JOUR

T1 - Fundamental consideration of junction formation strategies for phosphorus-doped emitters with J0e < 10 fA/cm2

AU - Min, Byungsul

AU - Krügener, Jan

AU - Müller, Matthias

AU - Bothe, Karsten

AU - Brendel, Rolf

N1 - Funding Information: This work was funded by the Federal Ministry for Economic Affairs and Energy (FKZ 0325777). Publisher Copyright: © 2017 The Authors. Published by Elsevier Ltd. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2017/9/21

Y1 - 2017/9/21

N2 - This work shows the potential of further optimization of phosphorus-doped emitters in p-type silicon solar cells. We investigate the impact of different combinations of phosphorus doping profiles and surface passivation qualities on the saturation current density J0e by considering boundary conditions based on published experimental data. Our simulation study shows that there are two possible ways to achieve J0e values below 10 fA/cm2. One is the reduction of the electrically active phosphorus concentration nsurf at the surface beneath 2×1019 cm-3 and simultaneously reducing the surface recombination velocity Sp to below 103 cm/s. The other contrarily increases nsurf to values of up to 1×1021 cm-3 while ensuring full activation of all phosphorus dopants. In the latter case, J0e values below 10 fA/cm2 seem possible, even for Sp = 107 cm/s which is equal to the thermal velocity.

AB - This work shows the potential of further optimization of phosphorus-doped emitters in p-type silicon solar cells. We investigate the impact of different combinations of phosphorus doping profiles and surface passivation qualities on the saturation current density J0e by considering boundary conditions based on published experimental data. Our simulation study shows that there are two possible ways to achieve J0e values below 10 fA/cm2. One is the reduction of the electrically active phosphorus concentration nsurf at the surface beneath 2×1019 cm-3 and simultaneously reducing the surface recombination velocity Sp to below 103 cm/s. The other contrarily increases nsurf to values of up to 1×1021 cm-3 while ensuring full activation of all phosphorus dopants. In the latter case, J0e values below 10 fA/cm2 seem possible, even for Sp = 107 cm/s which is equal to the thermal velocity.

KW - emitter

KW - junction formation

KW - passivation

KW - recombination

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U2 - 10.1016/j.egypro.2017.09.323

DO - 10.1016/j.egypro.2017.09.323

M3 - Conference article

AN - SCOPUS:85031917776

VL - 124

SP - 126

EP - 130

JO - Energy Procedia

JF - Energy Procedia

SN - 1876-6102

T2 - 7th International Conference on Silicon Photovoltaics, SiliconPV 2017

Y2 - 3 April 2017 through 5 April 2017

ER -

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