Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Frontiers of Characterization and Metrology for Nanoelectronics |
| Untertitel | ´ |
| Seiten | 324-329 |
| Seitenumfang | 6 |
| Publikationsstatus | Veröffentlicht - 14 Nov. 2011 |
| Extern publiziert | Ja |
| Veranstaltung | Frontiers of Characterization and Metrology for Nanoelectronics: 2011 - Grenoble, Frankreich Dauer: 23 Mai 2011 → 26 Mai 2011 |
Publikationsreihe
| Name | AIP Conference Proceedings |
|---|---|
| Band | 1395 |
| ISSN (Print) | 0094-243X |
| ISSN (elektronisch) | 1551-7616 |
Abstract
In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Allgemeine Physik und Astronomie
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Frontiers of Characterization and Metrology for Nanoelectronics: ´. 2011. S. 324-329 (AIP Conference Proceedings; Band 1395).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures
AU - Frenner, K.
AU - Paz, V. Ferreras
AU - Peterhänsel, S.
AU - Osten, W.
AU - Ovsianikov, A.
AU - Obata, K.
AU - Chichkov, B.
PY - 2011/11/14
Y1 - 2011/11/14
N2 - In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.
AB - In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.
KW - Scatterometry
KW - two-photon polymerization
KW - white-light-interference
UR - http://www.scopus.com/inward/record.url?scp=84861021617&partnerID=8YFLogxK
U2 - 10.1063/1.3657911
DO - 10.1063/1.3657911
M3 - Conference contribution
AN - SCOPUS:84861021617
SN - 9780735409651
T3 - AIP Conference Proceedings
SP - 324
EP - 329
BT - Frontiers of Characterization and Metrology for Nanoelectronics
T2 - Frontiers of Characterization and Metrology for Nanoelectronics: 2011
Y2 - 23 May 2011 through 26 May 2011
ER -