Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | L1172-L1177 |
| Fachzeitschrift | Surface science |
| Jahrgang | 391 |
| Ausgabenummer | 1-3 |
| Publikationsstatus | Veröffentlicht - 26 Nov. 1997 |
Abstract
Chemical wave patterns in the NO + H2 reaction on Rh(110) have been investigated on a surface roughened by Ar+ ion sputtering (4 keV, exposure 1016 ions/cm2). The study has been conducted in the 10-6-10-5 mbar range employing photoemission electron microscopy (PEEM) as a spatially resolving method. While the formation of rectangularly and elliptically shaped target patterns is not notably influenced by the roughness produced by sputtering, patches with reduced work functions develop on the surface upon collision of wave fronts. We attribute these patches, which are absent on a smooth Rh(110) surface, to a subsurface oxygen species whose formation is facilitated by structural defects on the surface.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
- Werkstoffwissenschaften (insg.)
- Werkstoffchemie
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
in: Surface science, Jahrgang 391, Nr. 1-3, 26.11.1997, S. L1172-L1177.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Formation of low work function patches in the NO + H2 reaction on a roughened Rh(110) surface
AU - Shaikhutdinov, S. K.
AU - Schaak, A.
AU - Imbihl, R.
PY - 1997/11/26
Y1 - 1997/11/26
N2 - Chemical wave patterns in the NO + H2 reaction on Rh(110) have been investigated on a surface roughened by Ar+ ion sputtering (4 keV, exposure 1016 ions/cm2). The study has been conducted in the 10-6-10-5 mbar range employing photoemission electron microscopy (PEEM) as a spatially resolving method. While the formation of rectangularly and elliptically shaped target patterns is not notably influenced by the roughness produced by sputtering, patches with reduced work functions develop on the surface upon collision of wave fronts. We attribute these patches, which are absent on a smooth Rh(110) surface, to a subsurface oxygen species whose formation is facilitated by structural defects on the surface.
AB - Chemical wave patterns in the NO + H2 reaction on Rh(110) have been investigated on a surface roughened by Ar+ ion sputtering (4 keV, exposure 1016 ions/cm2). The study has been conducted in the 10-6-10-5 mbar range employing photoemission electron microscopy (PEEM) as a spatially resolving method. While the formation of rectangularly and elliptically shaped target patterns is not notably influenced by the roughness produced by sputtering, patches with reduced work functions develop on the surface upon collision of wave fronts. We attribute these patches, which are absent on a smooth Rh(110) surface, to a subsurface oxygen species whose formation is facilitated by structural defects on the surface.
KW - Electron microscopy
KW - Hydrogen
KW - Nitrogen oxides
KW - Rhodium
KW - Surface chemical reaction
UR - http://www.scopus.com/inward/record.url?scp=0031270203&partnerID=8YFLogxK
U2 - 10.1016/S0039-6028(97)00609-2
DO - 10.1016/S0039-6028(97)00609-2
M3 - Article
AN - SCOPUS:0031270203
VL - 391
SP - L1172-L1177
JO - Surface science
JF - Surface science
SN - 0039-6028
IS - 1-3
ER -