Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • W. Lutz
  • D. Heidemann
  • C. H. Rüscher
  • J. Chr Buhl

Organisationseinheiten

Externe Organisationen

  • WITEGA Laboratorien Berlin-Adlershof GmbH
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Details

OriginalspracheEnglisch
Seiten (von - bis)9-14
Seitenumfang6
FachzeitschriftCrystal research and technology
Jahrgang36
Ausgabenummer1
PublikationsstatusVeröffentlicht - 12 März 2001

Abstract

Zeolite Y was steamed at 873 K for 7 h. This thermochemical treatment increases the Si/Al ratio of the zeolite framework from 2.4 to 3.8 under the formation of non-framework aluminium species. Successive leaching in 0.25 M KOH at 353 K for 24 h decreases the Si/Al ratio of the zeolite to 2.6 due to the formation of a X-ray amorphous potassium aluminosilicate surface layer.

ASJC Scopus Sachgebiete

Zitieren

Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching. / Lutz, W.; Heidemann, D.; Rüscher, C. H. et al.
in: Crystal research and technology, Jahrgang 36, Nr. 1, 12.03.2001, S. 9-14.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Lutz W, Heidemann D, Rüscher CH, Buhl JC. Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching. Crystal research and technology. 2001 Mär 12;36(1):9-14. doi: 10.1002/1521-4079(200101)36:1<9::AID-CRAT9>3.0.CO;2-T
Lutz, W. ; Heidemann, D. ; Rüscher, C. H. et al. / Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching. in: Crystal research and technology. 2001 ; Jahrgang 36, Nr. 1. S. 9-14.
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@article{9927dcf0ed034180916a6e04260861b2,
title = "Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching",
abstract = "Zeolite Y was steamed at 873 K for 7 h. This thermochemical treatment increases the Si/Al ratio of the zeolite framework from 2.4 to 3.8 under the formation of non-framework aluminium species. Successive leaching in 0.25 M KOH at 353 K for 24 h decreases the Si/Al ratio of the zeolite to 2.6 due to the formation of a X-ray amorphous potassium aluminosilicate surface layer.",
keywords = "Alkaline leaching, Dealumination, Realumination, Zeolite",
author = "W. Lutz and D. Heidemann and R{\"u}scher, {C. H.} and Buhl, {J. Chr}",
year = "2001",
month = mar,
day = "12",
doi = "10.1002/1521-4079(200101)36:1<9::AID-CRAT9>3.0.CO;2-T",
language = "English",
volume = "36",
pages = "9--14",
journal = "Crystal research and technology",
issn = "0232-1300",
publisher = "John Wiley and Sons Inc.",
number = "1",

}

Download

TY - JOUR

T1 - Formation of alkali-aluminosilicate layers on thermochemically dealuminated Y zeolites by alkaline leaching

AU - Lutz, W.

AU - Heidemann, D.

AU - Rüscher, C. H.

AU - Buhl, J. Chr

PY - 2001/3/12

Y1 - 2001/3/12

N2 - Zeolite Y was steamed at 873 K for 7 h. This thermochemical treatment increases the Si/Al ratio of the zeolite framework from 2.4 to 3.8 under the formation of non-framework aluminium species. Successive leaching in 0.25 M KOH at 353 K for 24 h decreases the Si/Al ratio of the zeolite to 2.6 due to the formation of a X-ray amorphous potassium aluminosilicate surface layer.

AB - Zeolite Y was steamed at 873 K for 7 h. This thermochemical treatment increases the Si/Al ratio of the zeolite framework from 2.4 to 3.8 under the formation of non-framework aluminium species. Successive leaching in 0.25 M KOH at 353 K for 24 h decreases the Si/Al ratio of the zeolite to 2.6 due to the formation of a X-ray amorphous potassium aluminosilicate surface layer.

KW - Alkaline leaching

KW - Dealumination

KW - Realumination

KW - Zeolite

UR - http://www.scopus.com/inward/record.url?scp=0035057552&partnerID=8YFLogxK

U2 - 10.1002/1521-4079(200101)36:1<9::AID-CRAT9>3.0.CO;2-T

DO - 10.1002/1521-4079(200101)36:1<9::AID-CRAT9>3.0.CO;2-T

M3 - Article

AN - SCOPUS:0035057552

VL - 36

SP - 9

EP - 14

JO - Crystal research and technology

JF - Crystal research and technology

SN - 0232-1300

IS - 1

ER -