Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 43-46 |
| Seitenumfang | 4 |
| Fachzeitschrift | Applied surface science |
| Jahrgang | 278 |
| Publikationsstatus | Veröffentlicht - 1 Feb. 2013 |
| Extern publiziert | Ja |
Abstract
Single-pulse femtosecond laser patterning of nitrobiphenylthiol monolayers on Au-coated Si substrates at λ = 800 nm, τ < 30 fs and ambient conditions has been investigated. After laser processing wet etching experiments are performed. Laser irradiation reduces the chemical resistance of the coating. In particular, the monolayer acts as a positive-tone resist. Burr-free pattern transfer is feasible at laser pulse fluences between 1 and 2.7 J/cm 2 . Minimum structure sizes at a 1/e laser spot diameter of about 1 μm are close to 300 nm, i.e. sub-wavelength processing is demonstrated. Noteworthy, however, no indications for negative-tone resist properties of processed monolayers are evident, that is, cross-linking of the biphenyl moieties, if at all, is marginal. Also, complementary labeling experiments provide no evidence for chemical transformation of the nitro end groups into amine functionalities. Perspectives of resonant fs-laser processing in exploiting the particular prospects of nitrobiphenylthiol monolayers as negative-tone resists and chemically patternable platforms are discussed.
ASJC Scopus Sachgebiete
- Chemie (insg.)
- Allgemeine Chemie
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Allgemeine Physik und Astronomie
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
in: Applied surface science, Jahrgang 278, 01.02.2013, S. 43-46.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Femtosecond-laser processing of nitrobiphenylthiol self-assembled monolayers
AU - Schröter, Anja
AU - Franzka, Steffen
AU - Koch, Jürgen
AU - Chichkov, Boris N.
AU - Ostendorf, Andreas
AU - Hartmann, Nils
PY - 2013/2/1
Y1 - 2013/2/1
N2 - Single-pulse femtosecond laser patterning of nitrobiphenylthiol monolayers on Au-coated Si substrates at λ = 800 nm, τ < 30 fs and ambient conditions has been investigated. After laser processing wet etching experiments are performed. Laser irradiation reduces the chemical resistance of the coating. In particular, the monolayer acts as a positive-tone resist. Burr-free pattern transfer is feasible at laser pulse fluences between 1 and 2.7 J/cm 2 . Minimum structure sizes at a 1/e laser spot diameter of about 1 μm are close to 300 nm, i.e. sub-wavelength processing is demonstrated. Noteworthy, however, no indications for negative-tone resist properties of processed monolayers are evident, that is, cross-linking of the biphenyl moieties, if at all, is marginal. Also, complementary labeling experiments provide no evidence for chemical transformation of the nitro end groups into amine functionalities. Perspectives of resonant fs-laser processing in exploiting the particular prospects of nitrobiphenylthiol monolayers as negative-tone resists and chemically patternable platforms are discussed.
AB - Single-pulse femtosecond laser patterning of nitrobiphenylthiol monolayers on Au-coated Si substrates at λ = 800 nm, τ < 30 fs and ambient conditions has been investigated. After laser processing wet etching experiments are performed. Laser irradiation reduces the chemical resistance of the coating. In particular, the monolayer acts as a positive-tone resist. Burr-free pattern transfer is feasible at laser pulse fluences between 1 and 2.7 J/cm 2 . Minimum structure sizes at a 1/e laser spot diameter of about 1 μm are close to 300 nm, i.e. sub-wavelength processing is demonstrated. Noteworthy, however, no indications for negative-tone resist properties of processed monolayers are evident, that is, cross-linking of the biphenyl moieties, if at all, is marginal. Also, complementary labeling experiments provide no evidence for chemical transformation of the nitro end groups into amine functionalities. Perspectives of resonant fs-laser processing in exploiting the particular prospects of nitrobiphenylthiol monolayers as negative-tone resists and chemically patternable platforms are discussed.
KW - Chemical patterning
KW - Dehydrogenation
KW - Negative-tone resist
KW - Nonlinear processing
KW - Self-assembled monolayer
KW - Ultrashort pulse laser
UR - http://www.scopus.com/inward/record.url?scp=84878578060&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2013.01.170
DO - 10.1016/j.apsusc.2013.01.170
M3 - Article
AN - SCOPUS:84878578060
VL - 278
SP - 43
EP - 46
JO - Applied surface science
JF - Applied surface science
SN - 0169-4332
ER -