TY - JOUR

T1 - Feature size below 100 nm realized by UV-LED- based microscope projection photolithography

AU - Zheng, Lei

AU - Birr, Tobias

AU - Zywietz, Urs

AU - Reinhardt, Carsten

AU - Roth, Bernhard

N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).

PY - 2023

Y1 - 2023

N2 - The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.

AB - The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.

KW - Microfabrication

KW - Nanofabrication

KW - Projection lithography

KW - Subwavelength structuring

KW - UV-LED lithography

UR - http://www.scopus.com/inward/record.url?scp=85183312906&partnerID=8YFLogxK

U2 - 10.37188/lam.2023.033

DO - 10.37188/lam.2023.033

M3 - Article

AN - SCOPUS:85183312906

VL - 4

SP - 1

EP - 10

JO - Light: Advanced Manufacturing

JF - Light: Advanced Manufacturing

SN - 2689-9620

IS - 4

ER -