Fabrication of quantum dots with scanning probe nanolithography

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • U. F. Keyser
  • H. W. Schumacher
  • U. Zeitler
  • R. J. Haug
  • K. Eberl

Organisationseinheiten

Externe Organisationen

  • Max-Planck-Institut für Festkörperforschung
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)681-684
Seitenumfang4
FachzeitschriftPhysica Status Solidi (B) Basic Research
Jahrgang224
Ausgabenummer3
PublikationsstatusVeröffentlicht - 1 Apr. 2001

Abstract

We are using an atomic force microscope for the direct fabrication of low-dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current-controlled local oxidation it is possible to design devices such as a single-electron transistor with different shapes. In this step-by-step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D-0D-2D and 2D-1D-2D tunneling characteristics.

ASJC Scopus Sachgebiete

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Fabrication of quantum dots with scanning probe nanolithography. / Keyser, U. F.; Schumacher, H. W.; Zeitler, U. et al.
in: Physica Status Solidi (B) Basic Research, Jahrgang 224, Nr. 3, 01.04.2001, S. 681-684.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Keyser UF, Schumacher HW, Zeitler U, Haug RJ, Eberl K. Fabrication of quantum dots with scanning probe nanolithography. Physica Status Solidi (B) Basic Research. 2001 Apr 1;224(3):681-684. doi: 10.1002/(SICI)1521-3951(200104)224:3<681::AID-PSSB681>3.0.CO;2-D
Keyser, U. F. ; Schumacher, H. W. ; Zeitler, U. et al. / Fabrication of quantum dots with scanning probe nanolithography. in: Physica Status Solidi (B) Basic Research. 2001 ; Jahrgang 224, Nr. 3. S. 681-684.
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