Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 1837-1846 |
| Seitenumfang | 10 |
| Fachzeitschrift | Spectrochimica Acta - Part B Atomic Spectroscopy |
| Jahrgang | 58 |
| Ausgabenummer | 10 |
| Publikationsstatus | Veröffentlicht - 17 Okt. 2003 |
Abstract
Today, most ablation systems operate at wavelengths in the UV region between 266 and 193 nm (experimental systems at 157 nm) to perform in-situ micro-analyses of solids in chemistry and earth sciences. The initially used solid-state laser technology of Nd:YAG laser ablation systems has been replaced in part by gas lasers such as excimer lasers operating in the deep UV region at 193 nm, which dominate the photolithography field in the semiconductor industry. Within this study an ablation system based on all-solid-state laser technology, operating at 193 nm, is described here along with its performance on high and low transparent materials. In order to describe the system to state-of-the-art instrumentation, results are compared with excimer data. However, the scope of the work is to describe alternative strategies to generate 193 nm.
ASJC Scopus Sachgebiete
- Chemie (insg.)
- Analytische Chemie
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Physik und Astronomie (insg.)
- Instrumentierung
- Chemie (insg.)
- Spektroskopie
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in: Spectrochimica Acta - Part B Atomic Spectroscopy, Jahrgang 58, Nr. 10, 17.10.2003, S. 1837-1846.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Evaluation and design of a solid-state 193 nm OPO-Nd:YAG laser ablation system
AU - Horn, Ingo
AU - Günther, Detlef
AU - Guillong, Marcel
N1 - Funding Information: This project was funded by ETH Zurich. We thank Joy Reid for reviewing which helped to improve the manuscript and Hansrüdi Kuhn for providing the excimer laser ablation data on brass B26. Support by CETAC Technologies is also acknowledged.
PY - 2003/10/17
Y1 - 2003/10/17
N2 - Today, most ablation systems operate at wavelengths in the UV region between 266 and 193 nm (experimental systems at 157 nm) to perform in-situ micro-analyses of solids in chemistry and earth sciences. The initially used solid-state laser technology of Nd:YAG laser ablation systems has been replaced in part by gas lasers such as excimer lasers operating in the deep UV region at 193 nm, which dominate the photolithography field in the semiconductor industry. Within this study an ablation system based on all-solid-state laser technology, operating at 193 nm, is described here along with its performance on high and low transparent materials. In order to describe the system to state-of-the-art instrumentation, results are compared with excimer data. However, the scope of the work is to describe alternative strategies to generate 193 nm.
AB - Today, most ablation systems operate at wavelengths in the UV region between 266 and 193 nm (experimental systems at 157 nm) to perform in-situ micro-analyses of solids in chemistry and earth sciences. The initially used solid-state laser technology of Nd:YAG laser ablation systems has been replaced in part by gas lasers such as excimer lasers operating in the deep UV region at 193 nm, which dominate the photolithography field in the semiconductor industry. Within this study an ablation system based on all-solid-state laser technology, operating at 193 nm, is described here along with its performance on high and low transparent materials. In order to describe the system to state-of-the-art instrumentation, results are compared with excimer data. However, the scope of the work is to describe alternative strategies to generate 193 nm.
KW - 193 nm
KW - Design
KW - Eximer
KW - Laser ablation
KW - OPO-d:YAG
UR - http://www.scopus.com/inward/record.url?scp=0142061179&partnerID=8YFLogxK
U2 - 10.1016/S0584-8547(03)00163-0
DO - 10.1016/S0584-8547(03)00163-0
M3 - Article
AN - SCOPUS:0142061179
VL - 58
SP - 1837
EP - 1846
JO - Spectrochimica Acta - Part B Atomic Spectroscopy
JF - Spectrochimica Acta - Part B Atomic Spectroscopy
SN - 0584-8547
IS - 10
ER -