Enabling rotary Atomic Layer Deposition for optical applications

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Leif Kochanneck
  • Andreas Tewes
  • Gerd Albert Hoffmann
  • Kalle Niiranen
  • John Rönn
  • Sami Sneck
  • Andreas Wienke
  • Detlev Ristau

Organisationseinheiten

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
  • Beneq Oy
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksOptical Interference Coatings, OIC 2022
ISBN (elektronisch)9781957171043
PublikationsstatusVeröffentlicht - 2022
VeranstaltungOptical Interference Coatings, OIC 2022 - Vancouver, Kanada
Dauer: 19 Juni 2022 → 24 Juni 2022

Publikationsreihe

NameOptics InfoBase Conference Papers
ISSN (elektronisch)2162-2701

Abstract

Ta2O5 and SiO2 films coated by rotary atomic layer deposition were studied. Investigations proved low absorption 3.1 ppm, respectively 6.0 ppm as well as uniformity 1.55 % and 2.71 % for growth rates up to 0.18 nm/sec.

ASJC Scopus Sachgebiete

Zitieren

Enabling rotary Atomic Layer Deposition for optical applications. / Kochanneck, Leif; Tewes, Andreas; Hoffmann, Gerd Albert et al.
Optical Interference Coatings, OIC 2022. 2022. (Optics InfoBase Conference Papers).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Kochanneck, L, Tewes, A, Hoffmann, GA, Niiranen, K, Rönn, J, Sneck, S, Wienke, A & Ristau, D 2022, Enabling rotary Atomic Layer Deposition for optical applications. in Optical Interference Coatings, OIC 2022. Optics InfoBase Conference Papers, Optical Interference Coatings, OIC 2022, Vancouver, Kanada, 19 Juni 2022. https://doi.org/10.1364/OIC.2022.TC.1
Kochanneck, L., Tewes, A., Hoffmann, G. A., Niiranen, K., Rönn, J., Sneck, S., Wienke, A., & Ristau, D. (2022). Enabling rotary Atomic Layer Deposition for optical applications. In Optical Interference Coatings, OIC 2022 (Optics InfoBase Conference Papers). https://doi.org/10.1364/OIC.2022.TC.1
Kochanneck L, Tewes A, Hoffmann GA, Niiranen K, Rönn J, Sneck S et al. Enabling rotary Atomic Layer Deposition for optical applications. in Optical Interference Coatings, OIC 2022. 2022. (Optics InfoBase Conference Papers). doi: 10.1364/OIC.2022.TC.1
Kochanneck, Leif ; Tewes, Andreas ; Hoffmann, Gerd Albert et al. / Enabling rotary Atomic Layer Deposition for optical applications. Optical Interference Coatings, OIC 2022. 2022. (Optics InfoBase Conference Papers).
Download
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AU - Sneck, Sami

AU - Wienke, Andreas

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