Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 3112-3117 |
| Seitenumfang | 6 |
| Fachzeitschrift | Applied optics |
| Jahrgang | 62 |
| Ausgabenummer | 12 |
| Publikationsstatus | Veröffentlicht - 17 Apr. 2023 |
Abstract
Atomic layer deposition (ALD) has been proven as an excellent method for depositing high-quality optical coatings due to its outstanding film quality and precise process control. Unfortunately, batch ALD requires time-consuming purge steps, which leads to low deposition rates and highly time-intensive processes for complex multilayer coatings. Recently, rotary ALD has been proposed for optical applications. In this, to the best of our knowledge, novel concept, each process step takes place in a separate part of the reactor divided by pressure and nitrogen curtains. To be coated, substrates are rotated through these zones. During each rotation, an ALD cycle is completed, and the deposition rate depends primarily on the rotation speed. In this work, the performance of a novel rotary ALD coating tool for optical applications is investigated and characterized with SiO2 and Ta2O5 layers. Low absorption levels of <3.1 ppm and <6.0 ppm are demonstrated at 1064 nm for around 186.2 nm thick single layers of Ta2O5 and 1032 nm SiO2, respectively. Growth rates up to 0.18 nm/s on fused silica substrates were achieved. Furthermore, excellent non-uniformity is also demonstrated, with values reaching as low as ±0.53% and ±1.07% over an area of 135 × 60 mm for Ta2O5 and SiO2, respectively.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Ingenieurwesen (insg.)
- Ingenieurwesen (sonstige)
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Applied optics, Jahrgang 62, Nr. 12, 17.04.2023, S. 3112-3117.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Enabling rotary atomic layer deposition for optical applications
AU - Kochanneck, Leif
AU - Rönn, John
AU - Tewes, Andreas
AU - Hoffmann, Gerd Albert
AU - Virtanen, Sauli
AU - Maydannik, Philipp
AU - Sneck, Sami
AU - Wienke, Andreas
AU - Ristau, Detlev
N1 - Funding Information: Acknowledgment. This work was supported by the European Regional Development Fund and also by the German Federal Ministry of Education and Research in the research project. The authors would like to thank the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) for funding this work under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD. Funding Information: Funding. European Regional Development Fund (ZW 2-80147672); and the German Federal Ministry of Education and Research (INTEGRA 01QE2032B); Deutsche Forschungsgemeinschaft (448756425, PhoenixD (EXC 2122, Project ID 390833453).
PY - 2023/4/17
Y1 - 2023/4/17
N2 - Atomic layer deposition (ALD) has been proven as an excellent method for depositing high-quality optical coatings due to its outstanding film quality and precise process control. Unfortunately, batch ALD requires time-consuming purge steps, which leads to low deposition rates and highly time-intensive processes for complex multilayer coatings. Recently, rotary ALD has been proposed for optical applications. In this, to the best of our knowledge, novel concept, each process step takes place in a separate part of the reactor divided by pressure and nitrogen curtains. To be coated, substrates are rotated through these zones. During each rotation, an ALD cycle is completed, and the deposition rate depends primarily on the rotation speed. In this work, the performance of a novel rotary ALD coating tool for optical applications is investigated and characterized with SiO2 and Ta2O5 layers. Low absorption levels of <3.1 ppm and <6.0 ppm are demonstrated at 1064 nm for around 186.2 nm thick single layers of Ta2O5 and 1032 nm SiO2, respectively. Growth rates up to 0.18 nm/s on fused silica substrates were achieved. Furthermore, excellent non-uniformity is also demonstrated, with values reaching as low as ±0.53% and ±1.07% over an area of 135 × 60 mm for Ta2O5 and SiO2, respectively.
AB - Atomic layer deposition (ALD) has been proven as an excellent method for depositing high-quality optical coatings due to its outstanding film quality and precise process control. Unfortunately, batch ALD requires time-consuming purge steps, which leads to low deposition rates and highly time-intensive processes for complex multilayer coatings. Recently, rotary ALD has been proposed for optical applications. In this, to the best of our knowledge, novel concept, each process step takes place in a separate part of the reactor divided by pressure and nitrogen curtains. To be coated, substrates are rotated through these zones. During each rotation, an ALD cycle is completed, and the deposition rate depends primarily on the rotation speed. In this work, the performance of a novel rotary ALD coating tool for optical applications is investigated and characterized with SiO2 and Ta2O5 layers. Low absorption levels of <3.1 ppm and <6.0 ppm are demonstrated at 1064 nm for around 186.2 nm thick single layers of Ta2O5 and 1032 nm SiO2, respectively. Growth rates up to 0.18 nm/s on fused silica substrates were achieved. Furthermore, excellent non-uniformity is also demonstrated, with values reaching as low as ±0.53% and ±1.07% over an area of 135 × 60 mm for Ta2O5 and SiO2, respectively.
UR - http://www.scopus.com/inward/record.url?scp=85158023912&partnerID=8YFLogxK
U2 - 10.1364/AO.477448
DO - 10.1364/AO.477448
M3 - Article
C2 - 37133158
AN - SCOPUS:85158023912
VL - 62
SP - 3112
EP - 3117
JO - Applied optics
JF - Applied optics
SN - 1559-128X
IS - 12
ER -