Electrically driven matter transport effects in PoP interconnections

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

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  • Universite de Bordeaux
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OriginalspracheEnglisch
Titel des Sammelwerks2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009
PublikationsstatusVeröffentlicht - 2009
Veranstaltung2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009 - Delft, Niederlande
Dauer: 26 Apr. 200929 Apr. 2009

Publikationsreihe

Name2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009

Abstract

The migration issue of Package-on-Package (PoP) is investigated in this article. The migration phenomenon can be amplified as the density of solder bumps increases, while the paths are very finer as well in PoP. These migration effects were first evaluated by three dimensional finite element simulations in ANSYS in a previous article [1], in which the bottom of the bump was found out to be the weakest part of the structure in the electrical, thermal and stress fields driven by current loads in the PoP assemblies. To verify this conclusion, the experiments were performed in the assembly cards for analyzing migration effects in PoP. "Top", ́bottoḿ and PoP components were assembled on test cards. Daisy chained bumps were chosen to investigate the migration phenomenon by comparing the behaviors between the single package ("top" and "bottom") and PoP. The test assembly cards were placed into a temperature-controlled chamber with one ampere current stressing the components. This experiment was performed at different temperatures. In conclusion, the migration problem of PoP was studied by experiments, and new simulations were also carried out. The IMCs were analyzed for understanding the migration phenomenon. The comparison of the simulation and experimental results indicates high electromigration mass flux divergences at the position of the open circuit.

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Electrically driven matter transport effects in PoP interconnections. / Feng, W.; Weide-Zaage, K.; Verdier, F. et al.
2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009. 2009. 4938457 (2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Feng, W, Weide-Zaage, K, Verdier, F, Plano, B, Guédon-Gracia, A & Frémont, H 2009, Electrically driven matter transport effects in PoP interconnections. in 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009., 4938457, 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009, 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009, Delft, Niederlande, 26 Apr. 2009. https://doi.org/10.1109/ESIME.2009.4938457
Feng, W., Weide-Zaage, K., Verdier, F., Plano, B., Guédon-Gracia, A., & Frémont, H. (2009). Electrically driven matter transport effects in PoP interconnections. In 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009 Artikel 4938457 (2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009). https://doi.org/10.1109/ESIME.2009.4938457
Feng W, Weide-Zaage K, Verdier F, Plano B, Guédon-Gracia A, Frémont H. Electrically driven matter transport effects in PoP interconnections. in 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009. 2009. 4938457. (2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009). doi: 10.1109/ESIME.2009.4938457
Feng, W. ; Weide-Zaage, K. ; Verdier, F. et al. / Electrically driven matter transport effects in PoP interconnections. 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009. 2009. (2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009).
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T1 - Electrically driven matter transport effects in PoP interconnections

AU - Feng, W.

AU - Weide-Zaage, K.

AU - Verdier, F.

AU - Plano, B.

AU - Guédon-Gracia, A.

AU - Frémont, H.

N1 - Copyright: Copyright 2009 Elsevier B.V., All rights reserved.

PY - 2009

Y1 - 2009

N2 - The migration issue of Package-on-Package (PoP) is investigated in this article. The migration phenomenon can be amplified as the density of solder bumps increases, while the paths are very finer as well in PoP. These migration effects were first evaluated by three dimensional finite element simulations in ANSYS in a previous article [1], in which the bottom of the bump was found out to be the weakest part of the structure in the electrical, thermal and stress fields driven by current loads in the PoP assemblies. To verify this conclusion, the experiments were performed in the assembly cards for analyzing migration effects in PoP. "Top", ́bottoḿ and PoP components were assembled on test cards. Daisy chained bumps were chosen to investigate the migration phenomenon by comparing the behaviors between the single package ("top" and "bottom") and PoP. The test assembly cards were placed into a temperature-controlled chamber with one ampere current stressing the components. This experiment was performed at different temperatures. In conclusion, the migration problem of PoP was studied by experiments, and new simulations were also carried out. The IMCs were analyzed for understanding the migration phenomenon. The comparison of the simulation and experimental results indicates high electromigration mass flux divergences at the position of the open circuit.

AB - The migration issue of Package-on-Package (PoP) is investigated in this article. The migration phenomenon can be amplified as the density of solder bumps increases, while the paths are very finer as well in PoP. These migration effects were first evaluated by three dimensional finite element simulations in ANSYS in a previous article [1], in which the bottom of the bump was found out to be the weakest part of the structure in the electrical, thermal and stress fields driven by current loads in the PoP assemblies. To verify this conclusion, the experiments were performed in the assembly cards for analyzing migration effects in PoP. "Top", ́bottoḿ and PoP components were assembled on test cards. Daisy chained bumps were chosen to investigate the migration phenomenon by comparing the behaviors between the single package ("top" and "bottom") and PoP. The test assembly cards were placed into a temperature-controlled chamber with one ampere current stressing the components. This experiment was performed at different temperatures. In conclusion, the migration problem of PoP was studied by experiments, and new simulations were also carried out. The IMCs were analyzed for understanding the migration phenomenon. The comparison of the simulation and experimental results indicates high electromigration mass flux divergences at the position of the open circuit.

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DO - 10.1109/ESIME.2009.4938457

M3 - Conference contribution

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SN - 9781424441617

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BT - 2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009

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Y2 - 26 April 2009 through 29 April 2009

ER -

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