Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 1237-1241 |
| Seitenumfang | 5 |
| Fachzeitschrift | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Jahrgang | 20 |
| Ausgabenummer | 4 |
| Publikationsstatus | Veröffentlicht - 27 Juni 2002 |
Abstract
The residual-gas effect on the sensitivity in TAMA300 was measured directly. It was found that a Xe-gas pressure of 0.03 Pa induces an increase in the displacement noise of 3X10-18m/√Hz. This noise level was found to be consistent with a calculated optical path fluctuation due to residual gas within a factor of 2.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Physik und Astronomie (insg.)
- Oberflächen und Grenzflächen
- Werkstoffwissenschaften (insg.)
- Oberflächen, Beschichtungen und Folien
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in: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Jahrgang 20, Nr. 4, 27.06.2002, S. 1237-1241.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Direct measurement of residual gas effect on the sensitivity in TAMA300
AU - Takahashi, R.
AU - Saito, Y.
AU - Fukushima, M.
AU - Ando, M.
AU - Arai, K.
AU - Tatsumi, D.
AU - Heinzel, G.
AU - Kawamura, S.
AU - Yamazaki, T.
AU - Moriwaki, S.
PY - 2002/6/27
Y1 - 2002/6/27
N2 - The residual-gas effect on the sensitivity in TAMA300 was measured directly. It was found that a Xe-gas pressure of 0.03 Pa induces an increase in the displacement noise of 3X10-18m/√Hz. This noise level was found to be consistent with a calculated optical path fluctuation due to residual gas within a factor of 2.
AB - The residual-gas effect on the sensitivity in TAMA300 was measured directly. It was found that a Xe-gas pressure of 0.03 Pa induces an increase in the displacement noise of 3X10-18m/√Hz. This noise level was found to be consistent with a calculated optical path fluctuation due to residual gas within a factor of 2.
UR - http://www.scopus.com/inward/record.url?scp=0036648855&partnerID=8YFLogxK
U2 - 10.1116/1.1479360
DO - 10.1116/1.1479360
M3 - Article
AN - SCOPUS:0036648855
VL - 20
SP - 1237
EP - 1241
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 4
ER -