Details
| Originalsprache | Englisch |
|---|---|
| Fachzeitschrift | Physical Review B |
| Publikationsstatus | Veröffentlicht - 2002 |
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Differences between hole and electron doping of a two-leg CuO ladder. / Nishimoto, S.; Jeckelmann, E.; Scalapino, D. J.
in: Physical Review B, 2002.
in: Physical Review B, 2002.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
Nishimoto, S, Jeckelmann, E & Scalapino, DJ 2002, 'Differences between hole and electron doping of a two-leg CuO ladder', Physical Review B. https://doi.org/10.1103/physrevb.66.245109
Nishimoto, S., Jeckelmann, E., & Scalapino, D. J. (2002). Differences between hole and electron doping of a two-leg CuO ladder. Physical Review B. https://doi.org/10.1103/physrevb.66.245109
Nishimoto S, Jeckelmann E, Scalapino DJ. Differences between hole and electron doping of a two-leg CuO ladder. Physical Review B. 2002. doi: 10.1103/physrevb.66.245109
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language = "English",
journal = "Physical Review B",
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TY - JOUR
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AU - Nishimoto, S.
AU - Jeckelmann, E.
AU - Scalapino, D. J.
PY - 2002
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