Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Modeling Aspects in Optical Metrology III |
| Publikationsstatus | Veröffentlicht - 23 Mai 2011 |
| Extern publiziert | Ja |
| Veranstaltung | Modeling Aspects in Optical Metrology III - Munich, Deutschland Dauer: 23 Mai 2011 → 24 Mai 2011 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8083 |
| ISSN (Print) | 0277-786X |
Abstract
Recently Fourier-Scatterometry has become of increasing interest for quantitative wafer metrology. But also in other fields the fast and precise optical characterization of periodical gratings of sub 100 nm size is of great interest. We present the application of Fourier-Scatterometry, extended by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. First a simulation-based sensitivity comparison of Fourier-Scatterometry at one fixed wavelength, Fourier-Scatterometry using a white light light source and also additionally using a reference-branch for white-light-interference has been carried out. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. The simulations were performed using the rigorous-coupled-wave-analysis included in our software package MicroSim. A sensitivity comparison between both methods is presented for the mentioned structure types. We also show our experimental implementation of the measurement setup using a white-light-laser and a modified microscope with a high-NA (NA: 0.95) objective as well as a Linnik-type reference branch for the phase sensitive measurements. First measurements for the investigation of the performance of this measurement setup are presented for comparison with the simulation results.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Modeling Aspects in Optical Metrology III. 2011. 80830M (Proceedings of SPIE - The International Society for Optical Engineering; Band 8083).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Depth sensitive Fourier-Scatterometry for the characterization of sub-100 nm periodic structures
AU - Ferreras Paz, V.
AU - Peterhänsel, S.
AU - Frenner, K.
AU - Osten, W.
AU - Ovsianikov, A.
AU - Obata, K.
AU - Chichkov, B.
PY - 2011/5/23
Y1 - 2011/5/23
N2 - Recently Fourier-Scatterometry has become of increasing interest for quantitative wafer metrology. But also in other fields the fast and precise optical characterization of periodical gratings of sub 100 nm size is of great interest. We present the application of Fourier-Scatterometry, extended by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. First a simulation-based sensitivity comparison of Fourier-Scatterometry at one fixed wavelength, Fourier-Scatterometry using a white light light source and also additionally using a reference-branch for white-light-interference has been carried out. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. The simulations were performed using the rigorous-coupled-wave-analysis included in our software package MicroSim. A sensitivity comparison between both methods is presented for the mentioned structure types. We also show our experimental implementation of the measurement setup using a white-light-laser and a modified microscope with a high-NA (NA: 0.95) objective as well as a Linnik-type reference branch for the phase sensitive measurements. First measurements for the investigation of the performance of this measurement setup are presented for comparison with the simulation results.
AB - Recently Fourier-Scatterometry has become of increasing interest for quantitative wafer metrology. But also in other fields the fast and precise optical characterization of periodical gratings of sub 100 nm size is of great interest. We present the application of Fourier-Scatterometry, extended by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. First a simulation-based sensitivity comparison of Fourier-Scatterometry at one fixed wavelength, Fourier-Scatterometry using a white light light source and also additionally using a reference-branch for white-light-interference has been carried out. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. The simulations were performed using the rigorous-coupled-wave-analysis included in our software package MicroSim. A sensitivity comparison between both methods is presented for the mentioned structure types. We also show our experimental implementation of the measurement setup using a white-light-laser and a modified microscope with a high-NA (NA: 0.95) objective as well as a Linnik-type reference branch for the phase sensitive measurements. First measurements for the investigation of the performance of this measurement setup are presented for comparison with the simulation results.
KW - Fourier-scatterometry
KW - High resolution metrology
KW - Pupil-plane scatterometry
KW - Sensitivity analysis
KW - Two-photon-polymerization
KW - White light interferometry
UR - http://www.scopus.com/inward/record.url?scp=79958061915&partnerID=8YFLogxK
U2 - 10.1117/12.889439
DO - 10.1117/12.889439
M3 - Conference contribution
AN - SCOPUS:79958061915
SN - 9780819486790
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Modeling Aspects in Optical Metrology III
T2 - Modeling Aspects in Optical Metrology III
Y2 - 23 May 2011 through 24 May 2011
ER -