Defect formation in oxide thin films

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Lars O. Jensen
  • Frank Wagner
  • Mathias Mende
  • Céline Gouldieff
  • Holger Blaschke
  • Jean Yves Natoli
  • Detlev Ristau

Externe Organisationen

  • Laser Zentrum Hannover e.V. (LZH)
  • Ecole Centrale Marseille
  • JENOPTIK Optical Systems GmbH
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Untertitel2011
PublikationsstatusVeröffentlicht - 22 Nov. 2011
Extern publiziertJa
Veranstaltung43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011 - Boulder, CO, USA / Vereinigte Staaten
Dauer: 18 Sept. 2010 → 21 Sept. 2010

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band8190
ISSN (Print)0277-786X

Abstract

In nanosecond laser damage investigations, the specific defect density in the optical component or thin film plays the key role in triggering optical breakdown. UV irradiation can induce additional defects in optical materials before the damaging event takes place. This increased defect density can even be the main cause for UV laser damage as shown before in fused silica. Moving on to oxide thin films, this contribution will present studies on SiO 2, Al 2O 3, and HfO 2 ion beam sputtered coatings. Pure material single layers as well as composite material single layers comprised of two oxides have been investigated concerning their tendency to generate additional defects resulting from UV laser irradiation. Within this work, tests at 355 nm and 266 nm have been performed and are compared.

ASJC Scopus Sachgebiete

Zitieren

Defect formation in oxide thin films. / Jensen, Lars O.; Wagner, Frank; Mende, Mathias et al.
43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. 81900D (Proceedings of SPIE - The International Society for Optical Engineering; Band 8190).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Jensen, LO, Wagner, F, Mende, M, Gouldieff, C, Blaschke, H, Natoli, JY & Ristau, D 2011, Defect formation in oxide thin films. in 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011., 81900D, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 8190, 43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011, Boulder, CO, USA / Vereinigte Staaten, 18 Sept. 2010. https://doi.org/10.1117/12.899113
Jensen, L. O., Wagner, F., Mende, M., Gouldieff, C., Blaschke, H., Natoli, J. Y., & Ristau, D. (2011). Defect formation in oxide thin films. In 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011 Artikel 81900D (Proceedings of SPIE - The International Society for Optical Engineering; Band 8190). https://doi.org/10.1117/12.899113
Jensen LO, Wagner F, Mende M, Gouldieff C, Blaschke H, Natoli JY et al. Defect formation in oxide thin films. in 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. 81900D. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.899113
Jensen, Lars O. ; Wagner, Frank ; Mende, Mathias et al. / Defect formation in oxide thin films. 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
Download
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