Computational manufacturing as a key element in the design–production chain for modern multilayer coatings

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Autoren

  • Tatiana V. Amotchkina
  • Sebastian Schlichting
  • Henrik Ehlers
  • Michael K. Trubetskov
  • Alexander V. Tikhonravov
  • Detlev Ristau

Organisationseinheiten

Externe Organisationen

  • Lomonosov Moscow State University
  • Max-Planck-Institut für Quantenoptik (MPQ)
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)7604-7615
Seitenumfang12
FachzeitschriftApplied Optics
Jahrgang51
Ausgabenummer31
PublikationsstatusVeröffentlicht - 1 Nov. 2012

Abstract

We propose a general approach that allows one to reveal factors causing production errors in the course of the deposition process controlled by broadband optical monitoring. We consider computational experiments simulating the real deposition process as a crucial point of this approach. We demonstrate application of the approach using multiple experimental deposition runs of the selected multilayer coatings.

ASJC Scopus Sachgebiete

Zitieren

Computational manufacturing as a key element in the design–production chain for modern multilayer coatings. / Amotchkina, Tatiana V.; Schlichting, Sebastian; Ehlers, Henrik et al.
in: Applied Optics, Jahrgang 51, Nr. 31, 01.11.2012, S. 7604-7615.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Amotchkina, TV, Schlichting, S, Ehlers, H, Trubetskov, MK, Tikhonravov, AV & Ristau, D 2012, 'Computational manufacturing as a key element in the design–production chain for modern multilayer coatings', Applied Optics, Jg. 51, Nr. 31, S. 7604-7615. https://doi.org/10.1364/AO.51.007604
Amotchkina, T. V., Schlichting, S., Ehlers, H., Trubetskov, M. K., Tikhonravov, A. V., & Ristau, D. (2012). Computational manufacturing as a key element in the design–production chain for modern multilayer coatings. Applied Optics, 51(31), 7604-7615. https://doi.org/10.1364/AO.51.007604
Amotchkina TV, Schlichting S, Ehlers H, Trubetskov MK, Tikhonravov AV, Ristau D. Computational manufacturing as a key element in the design–production chain for modern multilayer coatings. Applied Optics. 2012 Nov 1;51(31):7604-7615. doi: 10.1364/AO.51.007604
Amotchkina, Tatiana V. ; Schlichting, Sebastian ; Ehlers, Henrik et al. / Computational manufacturing as a key element in the design–production chain for modern multilayer coatings. in: Applied Optics. 2012 ; Jahrgang 51, Nr. 31. S. 7604-7615.
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@article{c52b00c626c1462c8e049a491f42192b,
title = "Computational manufacturing as a key element in the design–production chain for modern multilayer coatings",
abstract = "We propose a general approach that allows one to reveal factors causing production errors in the course of the deposition process controlled by broadband optical monitoring. We consider computational experiments simulating the real deposition process as a crucial point of this approach. We demonstrate application of the approach using multiple experimental deposition runs of the selected multilayer coatings.",
author = "Amotchkina, {Tatiana V.} and Sebastian Schlichting and Henrik Ehlers and Trubetskov, {Michael K.} and Tikhonravov, {Alexander V.} and Detlev Ristau",
year = "2012",
month = nov,
day = "1",
doi = "10.1364/AO.51.007604",
language = "English",
volume = "51",
pages = "7604--7615",
journal = "Applied Optics",
issn = "1559-128X",
publisher = "OSA - The Optical Society",
number = "31",

}

Download

TY - JOUR

T1 - Computational manufacturing as a key element in the design–production chain for modern multilayer coatings

AU - Amotchkina, Tatiana V.

AU - Schlichting, Sebastian

AU - Ehlers, Henrik

AU - Trubetskov, Michael K.

AU - Tikhonravov, Alexander V.

AU - Ristau, Detlev

PY - 2012/11/1

Y1 - 2012/11/1

N2 - We propose a general approach that allows one to reveal factors causing production errors in the course of the deposition process controlled by broadband optical monitoring. We consider computational experiments simulating the real deposition process as a crucial point of this approach. We demonstrate application of the approach using multiple experimental deposition runs of the selected multilayer coatings.

AB - We propose a general approach that allows one to reveal factors causing production errors in the course of the deposition process controlled by broadband optical monitoring. We consider computational experiments simulating the real deposition process as a crucial point of this approach. We demonstrate application of the approach using multiple experimental deposition runs of the selected multilayer coatings.

UR - http://www.scopus.com/inward/record.url?scp=84868360506&partnerID=8YFLogxK

U2 - 10.1364/AO.51.007604

DO - 10.1364/AO.51.007604

M3 - Article

AN - SCOPUS:84868360506

VL - 51

SP - 7604

EP - 7615

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

IS - 31

ER -