Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 2515-2518 |
| Seitenumfang | 4 |
| Fachzeitschrift | Journal of Optoelectronics and Advanced Materials |
| Jahrgang | 10 |
| Ausgabenummer | 10 |
| Publikationsstatus | Veröffentlicht - Okt. 2008 |
| Extern publiziert | Ja |
Abstract
Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Journal of Optoelectronics and Advanced Materials, Jahrgang 10, Nr. 10, 10.2008, S. 2515-2518.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Co-deposition of double layer antireflection coatings and laser induced damage threshold (LIDT) measurements at 1064 nm
T2 - Inhomogeneous systems
AU - Javed Akhtar, S. M.
AU - Mittendorf, F.
AU - Schink, H.
AU - Ristau, Detlev
AU - Ebert, Jürgen
AU - Welling, Herbert
PY - 2008/10
Y1 - 2008/10
N2 - Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
AB - Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
KW - Antireflection coatings
KW - Evaporated inhomogeneous coatings
KW - High damage threshold coatings
UR - http://www.scopus.com/inward/record.url?scp=55349111153&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:55349111153
VL - 10
SP - 2515
EP - 2518
JO - Journal of Optoelectronics and Advanced Materials
JF - Journal of Optoelectronics and Advanced Materials
SN - 1454-4164
IS - 10
ER -