Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 191-198 |
| Seitenumfang | 8 |
| Fachzeitschrift | Physica Status Solidi (A) Applied Research |
| Jahrgang | 115 |
| Ausgabenummer | 1 |
| Publikationsstatus | Veröffentlicht - 16 Sept. 1989 |
Abstract
A study on thin film optical materials is presented. Single layers of oxides, fluorides, and mixtures of various dielectrics are fabricated on suprasil substrates. Optimized parameters are used for deposition of each material. Optical characteristics of dielectric materials are determined. A Nd‐YAG laser with a maximum output energy of 250 mJ and pulse duration of 14 ns (FWHM) is used for damage experiments. X‐ray diffraction analysis of various dielectric materials for bulk and film specimen is also presented. Morphology of damage sites is done by Nomarsky and scanning electron microscopy.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
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in: Physica Status Solidi (A) Applied Research, Jahrgang 115, Nr. 1, 16.09.1989, S. 191-198.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Characterization of dielectric films and damage threshold at 1.064 μm
AU - Akhtar, S. M.J.
AU - Ristau, Detlev
AU - Ebert, Jürgen
AU - Welling, Herbert
PY - 1989/9/16
Y1 - 1989/9/16
N2 - A study on thin film optical materials is presented. Single layers of oxides, fluorides, and mixtures of various dielectrics are fabricated on suprasil substrates. Optimized parameters are used for deposition of each material. Optical characteristics of dielectric materials are determined. A Nd‐YAG laser with a maximum output energy of 250 mJ and pulse duration of 14 ns (FWHM) is used for damage experiments. X‐ray diffraction analysis of various dielectric materials for bulk and film specimen is also presented. Morphology of damage sites is done by Nomarsky and scanning electron microscopy.
AB - A study on thin film optical materials is presented. Single layers of oxides, fluorides, and mixtures of various dielectrics are fabricated on suprasil substrates. Optimized parameters are used for deposition of each material. Optical characteristics of dielectric materials are determined. A Nd‐YAG laser with a maximum output energy of 250 mJ and pulse duration of 14 ns (FWHM) is used for damage experiments. X‐ray diffraction analysis of various dielectric materials for bulk and film specimen is also presented. Morphology of damage sites is done by Nomarsky and scanning electron microscopy.
UR - http://www.scopus.com/inward/record.url?scp=0024735320&partnerID=8YFLogxK
U2 - 10.1002/pssa.2211150120
DO - 10.1002/pssa.2211150120
M3 - Article
AN - SCOPUS:0024735320
VL - 115
SP - 191
EP - 198
JO - Physica Status Solidi (A) Applied Research
JF - Physica Status Solidi (A) Applied Research
SN - 0031-8965
IS - 1
ER -