Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Interference Coatings |
| Untertitel | 25 - 27 May 1999, Berlin, Germany |
| Erscheinungsort | Bellingham |
| Seiten | 76-80 |
| Seitenumfang | 5 |
| Publikationsstatus | Veröffentlicht - 7 Sept. 1999 |
| Extern publiziert | Ja |
| Veranstaltung | 1999 Advances in Optical Interference Coatings - Berlin, Ger Dauer: 25 Mai 1999 → 27 Mai 1999 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Herausgeber (Verlag) | SPIE |
| Band | 3738 |
| ISSN (Print) | 0277-786X |
Abstract
SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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Advances in Optical Interference Coatings: 25 - 27 May 1999, Berlin, Germany. Bellingham, 1999. S. 76-80 (Proceedings of SPIE - The International Society for Optical Engineering; Band 3738).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Broad-band antireflection coatings deposited with ion-assisted evaporation
AU - Laux, Sven
AU - Kaiser, Norbert
AU - Niederwald, Hansjoerg
AU - Mertin, Michael
AU - Ehlers, Henrik
AU - Ristau, Detlev
PY - 1999/9/7
Y1 - 1999/9/7
N2 - SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
AB - SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
UR - http://www.scopus.com/inward/record.url?scp=0032664220&partnerID=8YFLogxK
U2 - 10.1117/12.360066
DO - 10.1117/12.360066
M3 - Conference contribution
AN - SCOPUS:0032664220
SN - 0-8194-3212-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 76
EP - 80
BT - Advances in Optical Interference Coatings
CY - Bellingham
T2 - 1999 Advances in Optical Interference Coatings
Y2 - 25 May 1999 through 27 May 1999
ER -