Details
Originalsprache | Englisch |
---|---|
Titel des Sammelwerks | Advances in Optical Thin Films IV |
Publikationsstatus | Veröffentlicht - 3 Okt. 2011 |
Extern publiziert | Ja |
Veranstaltung | Advances in Optical Thin Films IV - Marseille, Frankreich Dauer: 5 Sept. 2011 → 7 Sept. 2011 |
Publikationsreihe
Name | Proceedings of SPIE - The International Society for Optical Engineering |
---|---|
Band | 8168 |
ISSN (Print) | 0277-786X |
Abstract
Optical filters are used for a variety of purposes at astronomical telescopes. In the near infrared region, from 0.8 to 2.5 μm, bandpass and edge filters are used to separate the different astronomical channels, such as the J, H, and K bands. However, in the same wavelength range light emission generated in the earth's atmosphere is superimposed on the stellar radiation. Therefore, ground based astronomical instruments measure, in addition to the stellar light, also unwanted contributions from the earth's atmosphere. The characteristic lines of this OH emission are extremely narrow and distributed over the complete NIR spectral range. The sensitivity of future telescopes, like the European Extreme Large Telescope (E-ELT) which is currently being designed by ESO, can be dramatically improved if the atmospheric emission lines are effectively suppressed while the stellar radiation is efficiently transferred to the detector systems. For this task, new types of optical filters have to be developed. In this framework new design concepts and algorithms must be used, combining the measurement needs with practical restrictions. Certainly, the selected deposition process plays the key role in the manufacturing process. Precise and highly stable deposition systems are necessary to realise such filter systems with an appropriate homogeneity. Moreover, the production control techniques must be adapted to match the high level of precision required in the NIR range. Finally, the characterisation set-ups for such filters systems have to be provided. The manufacturing of such a filter system for a feasibility study of an E-ELT instrument is presented. The design development, the deposition with adapted Ion Beam Sputtering deposition plants, and the characterisation of such filters in the J-Band is described.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
Advances in Optical Thin Films IV. 2011. 1 (Proceedings of SPIE - The International Society for Optical Engineering; Band 8168).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Band-Pass and OH-Suppression Filters for the E-ELT
T2 - Advances in Optical Thin Films IV
AU - Günster, Stefan
AU - Ristau, Detlev
AU - Davies, R.
PY - 2011/10/3
Y1 - 2011/10/3
N2 - Optical filters are used for a variety of purposes at astronomical telescopes. In the near infrared region, from 0.8 to 2.5 μm, bandpass and edge filters are used to separate the different astronomical channels, such as the J, H, and K bands. However, in the same wavelength range light emission generated in the earth's atmosphere is superimposed on the stellar radiation. Therefore, ground based astronomical instruments measure, in addition to the stellar light, also unwanted contributions from the earth's atmosphere. The characteristic lines of this OH emission are extremely narrow and distributed over the complete NIR spectral range. The sensitivity of future telescopes, like the European Extreme Large Telescope (E-ELT) which is currently being designed by ESO, can be dramatically improved if the atmospheric emission lines are effectively suppressed while the stellar radiation is efficiently transferred to the detector systems. For this task, new types of optical filters have to be developed. In this framework new design concepts and algorithms must be used, combining the measurement needs with practical restrictions. Certainly, the selected deposition process plays the key role in the manufacturing process. Precise and highly stable deposition systems are necessary to realise such filter systems with an appropriate homogeneity. Moreover, the production control techniques must be adapted to match the high level of precision required in the NIR range. Finally, the characterisation set-ups for such filters systems have to be provided. The manufacturing of such a filter system for a feasibility study of an E-ELT instrument is presented. The design development, the deposition with adapted Ion Beam Sputtering deposition plants, and the characterisation of such filters in the J-Band is described.
AB - Optical filters are used for a variety of purposes at astronomical telescopes. In the near infrared region, from 0.8 to 2.5 μm, bandpass and edge filters are used to separate the different astronomical channels, such as the J, H, and K bands. However, in the same wavelength range light emission generated in the earth's atmosphere is superimposed on the stellar radiation. Therefore, ground based astronomical instruments measure, in addition to the stellar light, also unwanted contributions from the earth's atmosphere. The characteristic lines of this OH emission are extremely narrow and distributed over the complete NIR spectral range. The sensitivity of future telescopes, like the European Extreme Large Telescope (E-ELT) which is currently being designed by ESO, can be dramatically improved if the atmospheric emission lines are effectively suppressed while the stellar radiation is efficiently transferred to the detector systems. For this task, new types of optical filters have to be developed. In this framework new design concepts and algorithms must be used, combining the measurement needs with practical restrictions. Certainly, the selected deposition process plays the key role in the manufacturing process. Precise and highly stable deposition systems are necessary to realise such filter systems with an appropriate homogeneity. Moreover, the production control techniques must be adapted to match the high level of precision required in the NIR range. Finally, the characterisation set-ups for such filters systems have to be provided. The manufacturing of such a filter system for a feasibility study of an E-ELT instrument is presented. The design development, the deposition with adapted Ion Beam Sputtering deposition plants, and the characterisation of such filters in the J-Band is described.
KW - Astronomical coatings
KW - Coating deposition
KW - E-ELT
KW - NIR coatings
KW - Process control
KW - Stress
UR - http://www.scopus.com/inward/record.url?scp=80455174297&partnerID=8YFLogxK
U2 - 10.1117/12.896916
DO - 10.1117/12.896916
M3 - Conference contribution
AN - SCOPUS:80455174297
SN - 9780819487940
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films IV
Y2 - 5 September 2011 through 7 September 2011
ER -