Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autorschaft

  • Andreas Wolf
  • Barbara Terheiden
  • Rolf Brendel

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Herausgeber (Verlag)IEEE Computer Society
Seiten992-995
Seitenumfang4
ISBN (Print)1424400163, 9781424400164, 1-4244-0017-1
PublikationsstatusVeröffentlicht - 2006
Extern publiziertJa
Veranstaltung2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) - Waikoloa, HI, USA / Vereinigte Staaten
Dauer: 7 Mai 200612 Mai 2006
Konferenznummer: 4

Abstract

The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p+-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial growth of n-type silicon films. This "autodiffusion" process creates an emitter with a moderate surface concentration of 3×1018 cm-3 and a junction depth of 1.1 μm. The sheet resistance is 330 Ω/□. n-type thin-film solar cells with an autodiffused boron emitter on the rear side of the cells are fabricated. An independently confirmed energy conversion efficiency of 14.5 % with a short circuit current density of 33.3 mA/cm2 as measured under standard testing conditions is achieved for a 4 cm2 large cell with a thickness of 24 μm.

ASJC Scopus Sachgebiete

Ziele für nachhaltige Entwicklung

Zitieren

Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. / Wolf, Andreas; Terheiden, Barbara; Brendel, Rolf.
Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. S. 992-995 4059797.

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Wolf, A, Terheiden, B & Brendel, R 2006, Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4., 4059797, IEEE Computer Society, S. 992-995, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4), Waikoloa, HI, USA / Vereinigte Staaten, 7 Mai 2006. https://doi.org/10.1109/WCPEC.2006.279285
Wolf, A., Terheiden, B., & Brendel, R. (2006). Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (S. 992-995). Artikel 4059797 IEEE Computer Society. https://doi.org/10.1109/WCPEC.2006.279285
Wolf A, Terheiden B, Brendel R. Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society. 2006. S. 992-995. 4059797 doi: 10.1109/WCPEC.2006.279285
Wolf, Andreas ; Terheiden, Barbara ; Brendel, Rolf. / Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. S. 992-995
Download
@inproceedings{1cb651eeac4c4f9b93e1093277acefc7,
title = "Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells",
abstract = "The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p+-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial growth of n-type silicon films. This {"}autodiffusion{"} process creates an emitter with a moderate surface concentration of 3×1018 cm-3 and a junction depth of 1.1 μm. The sheet resistance is 330 Ω/□. n-type thin-film solar cells with an autodiffused boron emitter on the rear side of the cells are fabricated. An independently confirmed energy conversion efficiency of 14.5 % with a short circuit current density of 33.3 mA/cm2 as measured under standard testing conditions is achieved for a 4 cm2 large cell with a thickness of 24 μm.",
author = "Andreas Wolf and Barbara Terheiden and Rolf Brendel",
note = "Funding Information: This work is supported by the German Federal Ministry of Environ- ment, Nature Conversation and Nuclear Safety under con- tract 0329816E.; 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) ; Conference date: 07-05-2006 Through 12-05-2006",
year = "2006",
doi = "10.1109/WCPEC.2006.279285",
language = "English",
isbn = "1424400163",
pages = "992--995",
booktitle = "Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4",
publisher = "IEEE Computer Society",
address = "United States",

}

Download

TY - GEN

T1 - Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells

AU - Wolf, Andreas

AU - Terheiden, Barbara

AU - Brendel, Rolf

N1 - Conference code: 4

PY - 2006

Y1 - 2006

N2 - The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p+-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial growth of n-type silicon films. This "autodiffusion" process creates an emitter with a moderate surface concentration of 3×1018 cm-3 and a junction depth of 1.1 μm. The sheet resistance is 330 Ω/□. n-type thin-film solar cells with an autodiffused boron emitter on the rear side of the cells are fabricated. An independently confirmed energy conversion efficiency of 14.5 % with a short circuit current density of 33.3 mA/cm2 as measured under standard testing conditions is achieved for a 4 cm2 large cell with a thickness of 24 μm.

AB - The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p+-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial growth of n-type silicon films. This "autodiffusion" process creates an emitter with a moderate surface concentration of 3×1018 cm-3 and a junction depth of 1.1 μm. The sheet resistance is 330 Ω/□. n-type thin-film solar cells with an autodiffused boron emitter on the rear side of the cells are fabricated. An independently confirmed energy conversion efficiency of 14.5 % with a short circuit current density of 33.3 mA/cm2 as measured under standard testing conditions is achieved for a 4 cm2 large cell with a thickness of 24 μm.

UR - http://www.scopus.com/inward/record.url?scp=41749120312&partnerID=8YFLogxK

U2 - 10.1109/WCPEC.2006.279285

DO - 10.1109/WCPEC.2006.279285

M3 - Conference contribution

AN - SCOPUS:41749120312

SN - 1424400163

SN - 9781424400164

SN - 1-4244-0017-1

SP - 992

EP - 995

BT - Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

PB - IEEE Computer Society

T2 - 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4)

Y2 - 7 May 2006 through 12 May 2006

ER -